Ethane

Ethane

SCHEMBL27712940

C=CC(=O)OC(OC(=O)c1ccccc1C(=O)O)C(C)O.CC

nearest known ligand 0.44

Full drug profile on Sugi Atlas →

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.44
ALOX15 P16050 1/20 0.38
KDM4E B2RXH2 3/20 0.37
TAAR1 Q96RJ0 1/20 0.37
TSHR P16473 1/20 0.36
CYP3A4 P08684 1/20 0.36
HPGD P15428 2/20 0.35
HSD17B10 Q99714 2/20 0.35
MAPT P10636 1/20 0.35
PTPN1 P18031 1/20 0.34
KMT2A Q03164 2/20 0.34
LMNA P02545 1/20 0.34
NPC1 O15118 1/20 0.33
USP2 O75604 1/20 0.33
TP53 P04637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21603041 0.99 ALDH1A1 (0.45) ALDH1A1ALOX15KDM4ETAAR1TSHR
SCHEMBL21603039 0.93 TSHR (0.40) ALDH1A1KDM4ETSHRCYP3A4HSD17B10
SCHEMBL27512398 0.89 ALDH1A1 (0.46) ALDH1A1ALOX15KDM4ETSHRCYP3A4
SCHEMBL27993933 0.88 TSHR (0.41) ALDH1A1ALOX15KDM4ETSHRCYP3A4
SCHEMBL28122876 0.84 ALDH1A1 (0.48) ALDH1A1ALOX15KDM4ETSHRCYP3A4
Phthalic Acid SCHEMBL27722619 0.84 ALDH1A1 (0.36) ALDH1A1ALOX15KDM4ETAAR1TSHR
SCHEMBL10618000 0.84 ALDH1A1 (0.44) ALDH1A1ALOX15KDM4ETAAR1TSHR
SCHEMBL301791 0.83 ALDH1A1 (0.48) ALDH1A1ALOX15KDM4ETSHRCYP3A4
SCHEMBL2813872 0.83 ALDH1A1 (0.51) ALDH1A1ALOX15KDM4ETSHRCYP3A4
Phthalic Acid SCHEMBL301413 0.81 ALDH1A1 (0.47) ALDH1A1ALOX15KDM4ETSHRHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103305054-A Actinic radiation-curing type ink set, inkjet recording method, and printed material FUJIFILM CORP 2013-09-18 CN disclosed
CN-101124517-B Photosensitive resin composition and photosensitive dry film using the same TOKYO OHKA KOGYO CO LTD 2011-04-13 CN disclosed
CN-101124517-A Photosensitive resin composition and photosensitive dry film using the same TOKYO OHKA KOGYO CO LTD (JP) 2008-02-13 CN disclosed