SCHEMBL277241

SCHEMBL277241

CCCC(C)(C)C([NH])=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8847814 0.84 GGPS1 (0.37)
SCHEMBL8848020 0.82 GGPS1 (0.45)
SCHEMBL7302846 0.80 GGPS1 (0.48)
SCHEMBL8121043 0.80 GGPS1 (0.48)
SCHEMBL7890610 0.77 TDP1 (0.39)
SCHEMBL276729 0.77
SCHEMBL276239 0.74
SCHEMBL277242 0.74
SCHEMBL859738 0.74
SCHEMBL277329 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 146 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9543147-B2 Photoresist and method of manufacture TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2017-01-10 US disclosed
EP-2439204-B1 HETEROCYCLIC COMPOUND AND HEMATOPOIETIC STEM CELL AMPLIFIER NISSAN CHEMICAL IND LTD (JP) 2017-01-04 EP disclosed
US-9527828-B2 Method for expanding hematopoietic stem cells using heterocyclic compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-12-27 US disclosed
US-9502231-B2 Photoresist layer and method TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2016-11-22 US disclosed
EP-2218716-B1 METHOD FOR AMPLIFYING HEMATOPOIETIC STEM CELLS USING HETEROCYCLIC COMPOUND NISSAN CHEMICAL IND LTD (JP) 2016-11-16 EP disclosed
US-9460909-B2 Method for manufacturing semiconductor device TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2016-10-04 US disclosed
EP-1698620-B1 BENZENE COMPOUNDS DISUBSTITUTED WITH CYCLIC GROUPS AT THE 1- AND 2-POSITIONS EISAI R&D MAN CO LTD (JP) 2016-09-28 EP disclosed
US-9436086-B2 Anti-reflective layer and method TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2016-09-06 US disclosed
US-20160155626-A1 Method for Manufacturing Semiconductor Device TAIWAN SEMICONDUCTOR MFG (TW) 2016-06-02 US disclosed
US-20160155632-A1 Anti-Reflective Layer and Method TAIWAN SEMICONDUCTOR MFG (TW) 2016-06-02 US disclosed
WO-1996016029-A1 2-(4-BIPHENYL-OXYMETHYLENE)ANILIDES, PROCESS AND INTERMEDIATE PRODUCTS FOR PREPARING THE SAME AND THEIR USE AS PESTICIDES BASF AKTIENGESELLSCHAFT (DE) 1996-05-30 WO disclosed
WO-1996001258-A1 2-[1',2',4'-TRIAZOL-3'-YLOXYMETHYLENE]-ANILIDES AND THEIR USE AS PEST-CONTROL AGENTS BASF AKTIENGESELLSCHAFT (DE) 1996-01-18 WO disclosed
WO-1996001256-A1 USE OF 2-[(DIHYDRO)PYRAZOLYL-3'-OXYMETHYLENE]-ANILIDES AS PEST-CONTROL AGENTS AND FUNGICIDES BASF AKTIENGESELLSCHAFT (DE) 1996-01-18 WO disclosed
EP-0686152-A1 ORTHO-SUBSTITUTED 2-METHOXYIMINOPHENYLACETIC ACID METHYLAMIDES BASF AG (DE) 1995-12-13 EP disclosed
WO-1995029896-A1 ALPHA-(PYRAZOL-3-YL)-OXYMETHYLENE-PHENYLBUTENIC ACID METHYL ESTERS AND THE USE THEREOF AGAINST HARMFUL FUNGI OR ANIMAL PESTS BASF AKTIENGESELLSCHAFT (DE) 1995-11-09 WO disclosed
EP-0668852-A1 SUBSTITUTED ORTHO-ETHENYL-PHENYL ACETIC ACID DERIVATIVES BASF Aktiengesellschaft (DE) 1995-08-30 EP disclosed
WO-1994019331-A1 ORTHO-SUBSTITUTED 2-METHOXYIMINOPHENYLACETIC ACID METHYLAMIDES BASF AKTIENGESELLSCHAFT (DE) 1994-09-01 WO disclosed
EP-0414058-B1 Carboxylic acid derivatives BASF AG (DE) 1994-06-15 EP disclosed
WO-1994011334-A1 SUBSTITUTED ORTHO-ETHENYL-PHENYL ACETIC ACID DERIVATIVES BASF AKTIENGESELLSCHAFT (DE) 1994-05-26 WO disclosed
EP-0414058-A2 Carboxylic acid derivatives BASF Aktiengesellschaft (DE) 1991-02-27 EP disclosed