SCHEMBL27729459

SCHEMBL27729459

C=C(CC)C(=O)OC.N=C=O

nearest known ligand 0.41

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.41
TSHR P16473 1/20 0.32
TET2 Q6N021 1/20 0.30
EGLN1 Q9GZT9 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL146425 0.89
Ethane SCHEMBL27515406 0.86 ALDH1A1 (0.48) ALDH1A1TSHRTET2EGLN1
Ethylene SCHEMBL1626809 0.86 ALDH1A1 (0.48) ALDH1A1TSHRTET2EGLN1
SCHEMBL28020829 0.86
Hydrochloric Acid SCHEMBL2969949 0.86
Bicarbonate SCHEMBL28015990 0.84 ALDH1A1 (0.46) ALDH1A1TSHRTET2EGLN1
Acetone SCHEMBL28038069 0.84 ALDH1A1 (0.52) ALDH1A1TSHRTET2EGLN1
Dimethylamine SCHEMBL27622469 0.84 ALDH1A1 (0.46) ALDH1A1TSHRTET2EGLN1
SCHEMBL27729609 0.83 ALDH1A1 (0.38) ALDH1A1TSHR
SCHEMBL28046858 0.83 ALDH1A1 (0.32) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117363102-A High-temperature-resistant insulating ink for solvent-free inkjet 3D printing and preparation method and application thereof 中国科学院兰州化学物理研究所 2024-01-09 CN claimed
CN-113426309-B Soybean oil photosensitive resin and oil-water separation film prepared based on template method 广东工业大学 2023-08-22 CN claimed
CN-117363102-A High-temperature-resistant insulating ink for solvent-free inkjet 3D printing and preparation method and application thereof 中国科学院兰州化学物理研究所 2024-01-09 CN disclosed
CN-114409644-B Preparation method of quick photo-curing benzoxazine, application of quick photo-curing benzoxazine and photo-curing benzoxazine resin 中国科学院兰州化学物理研究所 2023-09-01 CN disclosed
CN-113426309-B Soybean oil photosensitive resin and oil-water separation film prepared based on template method 广东工业大学 2023-08-22 CN disclosed
CN-114561164-A Post-curable optical transparent adhesive tape and preparation method thereof 苏州赛伍应用技术股份有限公司 2022-05-31 CN disclosed
CN-110167981-A COPOLYMER AND RESIN COMPOSITION 株式会社日本触媒 2019-08-23 CN disclosed
CN-110157362-A A kind of preparation method of the nano combined binder of waterborne flame retardant type 浙江理工大学 2019-08-23 CN disclosed
CN-108824035-A A kind of fabrics printing and dyeing color fixing agent and preparation method thereof 陈国宝 2018-11-16 CN disclosed
CN-108026387-A For the hardening resin composition of stripping film, stripping film, use the technique base material for having the stripping film and the method for protecting base material 日油株式会社 2018-05-11 CN disclosed
CN-107849202-A NEUTRAL LAYER COMPOSITION 株式会社LG化学 2018-03-27 CN disclosed
CN-105683257-A Addition-fragmentation oligomers containing allyl disulfide 3M创新有限公司 2016-06-15 CN disclosed
CN-105636991-A Photosensitive resin composition for forming curved member, photosensitive resin film for forming curved member using same, and lens member using same HITACHI CHEMICAL CO LTD 2016-06-01 CN disclosed
CN-105377811-A Cyanostilbenes ROLIC AG 2016-03-02 CN disclosed
CN-105026027-A A liquid processing mixer and method HARIMA CHEMICALS INC 2015-11-04 CN disclosed
CN-101415330-B Biological antifouling agent, antifouling paint, antifouling treatment method, and antifouling treated article UNIV KOCHI TECHNOLOGY 2013-09-04 CN disclosed
CN-101154042-B Curing composition for nano-imprint lithography and pattern forming method using the same FUJI PHOTO FILM CO LTD 2012-07-04 CN disclosed
CN-101639627-A Photosensitive composition, photosensitive thin-film, photosensitive laminate material, method for forming permanent pattern and printed circuit board FUJI PHOTO FILM CO LTD JP 2010-02-03 CN disclosed
CN-101415330-A Biological antifouling agent, antifouling paint, antifouling treatment method, and antifouling treated article KOCHI PREFECTURE (JP) 2009-04-22 CN disclosed
CN-101154042-A Curing composition for nano-imprint lithography and pattern forming method using the same FUJIFILM CORP (JP) 2008-04-02 CN disclosed