SCHEMBL27730758

SCHEMBL27730758

C(OCC1CO1)C1CO1.CC(OCCO)=C(C)C(=O)O

nearest known ligand 0.41

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.41
TSHR P16473 2/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
TDP1 Q9NUW8 1/20 0.36
MAPK1 P28482 1/20 0.35
TP53 P04637 1/20 0.35
CYP3A4 P08684 1/20 0.35
MGLL Q99685 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2722563 0.82 ALDH1A1 (0.55) ALDH1A1TP53CYP3A4MGLL
SCHEMBL252102 0.80 TSHR (0.38) ALDH1A1TSHR
Methacrylic Acid SCHEMBL9005438 0.79 ALDH1A1 (0.62) ALDH1A1TSHRSMN1; SMN2TDP1MAPK1
SCHEMBL27471277 0.78 ALDH1A1 (0.44) ALDH1A1TSHRSMN1; SMN2TDP1MAPK1
SCHEMBL1032756 0.77 ALDH1A1 (0.68) ALDH1A1TSHRSMN1; SMN2TDP1MAPK1
Acetic Acid SCHEMBL28845095 0.76 ALDH1A1 (0.53) ALDH1A1TSHRSMN1; SMN2TDP1MAPK1
SCHEMBL28018577 0.76 ALDH1A1 (0.38) ALDH1A1TSHRSMN1; SMN2TDP1MAPK1
Methacrylic Acid SCHEMBL10989721 0.76 ALDH1A1 (0.56) ALDH1A1TSHRSMN1; SMN2TDP1MAPK1
Oxalic Acid SCHEMBL28735102 0.74 TSHR (0.52) ALDH1A1TSHRSMN1; SMN2TDP1MAPK1
Acetone SCHEMBL27530864 0.74 ALDH1A1 (0.55) ALDH1A1TSHRSMN1; SMN2TDP1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105849640-B The photosensitive resin composition of dry film photoresist 可隆工业株式会社 2019-11-26 CN disclosed
CN-107924129-B The manufacturing method of photoresist printing plate precursor and galley 东丽株式会社 2019-03-26 CN disclosed
CN-107924129-A The manufacture method of photoresist printing plate precursor and galley 东丽株式会社 2018-04-17 CN disclosed
CN-103153637-B Method for producing flexographic plate original for laser engraving TORAY INDUSTRIES 2015-07-08 CN disclosed
CN-103176362-A Photosensitive resin composite for dry film photoresist KOLON INC 2013-06-26 CN disclosed
CN-103153637-A Method for producing flexographic plate original for laser engraving TORAY INDUSTRIES 2013-06-12 CN disclosed
CN-101160639-B Method of reusing flexible mold and microstructure precursor composition 3M INNOVATIVE PROPERTIES CO 2011-03-02 CN disclosed
CN-101160639-A Method of reusing flexible mold and microstructure precursor composition 3M INNOVATIVE PROPERTIES CO (US) 2008-04-09 CN disclosed