Iodide

Iodide

SCHEMBL2773083

CCC(C)(C)c1ccc(OS(=O)(=O)O)cc1.I

nearest known ligand 0.49

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG

The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 0.49
RAB9A P51151 3/20 0.49
MAPT P10636 1/20 0.49
POLB P06746 1/20 0.44
CYP2C9 P11712 1/20 0.44
CA1 P00915 1/20 0.43
CA2 P00918 1/20 0.43
CA9 Q16790 1/20 0.43
TDP1 Q9NUW8 1/20 0.41
HRH3 Q9Y5N1 8/20 0.40
MAOB P27338 4/20 0.40
SMN1; SMN2 Q16637 2/20 0.39
CYP3A4 P08684 1/20 0.39
LMNA P02545 1/20 0.39
MAPK1 P28482 1/20 0.39
CASP3 P42574 1/20 0.39
ATM Q13315 1/20 0.39
SENP8 Q96LD8 1/20 0.39
SENP7 Q9BQF6 1/20 0.39
SENP6 Q9GZR1 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5269496 0.98 NPC1 (0.50) NPC1RAB9AMAPTPOLBCYP2C9
Iodide SCHEMBL2920576 0.86 NPC1 (0.51) NPC1RAB9AMAPTPOLBCYP2C9
SCHEMBL5269493 0.84 NPC1 (0.53) NPC1RAB9AMAPTPOLBCYP2C9
SCHEMBL10180412 0.82 NPC1 (0.51) NPC1RAB9AMAPTPOLBCYP2C9
SCHEMBL10182176 0.82 NPC1 (0.51) NPC1RAB9AMAPTPOLBCYP2C9
SCHEMBL10180126 0.81 NPC1 (0.51) NPC1RAB9AMAPTPOLBCYP2C9
SCHEMBL5270879 0.81 NPC1 (0.50) NPC1RAB9AMAPTPOLBCYP2C9
SCHEMBL22518676 0.81 NPC1 (0.50) NPC1RAB9AMAPTPOLBCYP2C9
SCHEMBL10625087 0.80 CA2 (0.50) MAPTPOLBCA1CA2CA9
SCHEMBL5269351 0.80 CA1 (0.66) NPC1RAB9AMAPTCA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1117002-B1 Negative-working resist composition FUJIFILM CORP (JP) 2010-04-14 EP disclosed
US-6720128-B2 AMPLIFICATION; ACCURACY PATTERN PROFILE; EXPOSURE TO ELECTRON BEAMS FUJI PHOTO FILM CO., LTD. (JP) 2004-04-13 US disclosed
EP-1117004-A2 Electron beam or x-ray negative-working resist composition FUJI PHOTO FILM CO., LTD. (JP) 2001-07-18 EP disclosed
EP-1117002-A1 Negative-working resist composition FUJI PHOTO FILM CO., LTD. (JP) 2001-07-18 EP disclosed