SCHEMBL27731561

SCHEMBL27731561

CN(C)C1C(=Cc2ccccc2)C(=O)CCC1O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.42
CYP1A2 P05177 4/20 0.42
LMNA P02545 2/20 0.42
CYP2D6 P10635 2/20 0.42
CYP2C19 P33261 2/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
NPSR1 Q6W5P4 1/20 0.42
NFKB1 P19838 2/20 0.38
NFKB2 Q00653 2/20 0.38
RELA Q04206 2/20 0.38
ALDH1A1 P00352 3/20 0.37
HTT P42858 1/20 0.37
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
HPGD P15428 3/20 0.35
F3 P13726 1/20 0.35
MGAM O43451 2/20 0.33
GAA P10253 2/20 0.33
SI P14410 2/20 0.33
MGAM2 Q2M2H8 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27546161 0.85 MAPT (0.40) MAPTCYP1A2LMNACYP2D6CYP2C19
SCHEMBL28297691 0.77 CYP1A2 (0.42) MAPTCYP1A2LMNACYP2D6CYP2C19
SCHEMBL4752789 0.74 ALDH1A1 (0.46) MAPTCYP1A2LMNACYP2D6CYP2C19
SCHEMBL14223874 0.73 CYP1A2 (0.50) MAPTCYP1A2LMNACYP2D6CYP2C19
SCHEMBL9047443 0.73 CYP1A2 (0.50) MAPTCYP1A2LMNACYP2D6CYP2C19
SCHEMBL9047452 0.73 CYP1A2 (0.50) MAPTCYP1A2LMNACYP2D6CYP2C19
SCHEMBL28774802 0.71 CYP1A2 (0.37) MAPTCYP1A2LMNACYP2D6CYP2C19
SCHEMBL28845442 0.70 CYP1A2 (0.46) MAPTCYP1A2LMNACYP2D6CYP2C19
SCHEMBL1672193 0.70 CYP1A2 (0.43) MAPTCYP1A2LMNACYP2D6CYP2C19
SCHEMBL27915218 0.70 CYP1A2 (0.43) MAPTCYP1A2LMNACYP2D6CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101371197-B Photosensitive dry film resist, printed wiring board making use of the same, and process for producing printed wiring board KANEKA CORP 2012-12-26 CN disclosed
CN-101371197-A Photosensitive dry film resist, printed wiring board making use of the same, and process for producing printed wiring board KANEGAFUCHI CHEMICAL IND (JP) 2009-02-18 CN disclosed
CN-100425602-C Diamine, acid dianhydride, polyimide composition having reactive group obtained therefrom, and processes for producing these KANEGAFUCHI CHEMICAL IND (JP) 2008-10-15 CN disclosed
CN-100425637-C Poly-imide precursor, its preparing process and resin composition using same KANEGAFUCHI CHEMICAL IND (JP) 2008-10-15 CN disclosed
CN-1501921-A Diamine, acid dianhydride, polyimide composition having reactive group and comprising the same, and method for producing the same 钟渊化学工业株式会社 2004-06-02 CN disclosed
CN-1427022-A Poly-imide precursor, its preparing process and resin composition using same KANEGAFUCHI CHEMICAL IND (JP) 2003-07-02 CN disclosed