SCHEMBL27736720

SCHEMBL27736720

CCCCCOC(=O)CCCCC(=O)OC

nearest known ligand 0.70

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
DGKA P23743 1/20 0.70
NAAA Q02083 1/20 0.59
PRSS1 P07477 1/20 0.58
PRSS2 P07478 1/20 0.58
PRSS3 P35030 1/20 0.58
DNM1 Q05193 1/20 0.58
HTR2C P28335 1/20 0.56
EPHX2 P34913 3/20 0.55
TSHR P16473 2/20 0.54
PAM P19021 2/20 0.53
FAAH O00519 1/20 0.53
EPHX1 P07099 1/20 0.50
MAPT P10636 1/20 0.50
RAD52 P43351 1/20 0.50
NPSR1 Q6W5P4 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17123126 0.98 DGKA (0.74) DGKANAAAPRSS1PRSS2PRSS3
SCHEMBL3505249 0.98 DGKA (0.74) DGKANAAAPRSS1PRSS2PRSS3
SCHEMBL17123133 0.98 DGKA (0.74) DGKANAAAPRSS1PRSS2PRSS3
SCHEMBL14213382 0.98 DGKA (0.74) DGKANAAAPRSS1PRSS2PRSS3
SCHEMBL14449519 0.98 DGKA (0.74) DGKANAAAPRSS1PRSS2PRSS3
SCHEMBL17123130 0.98 DGKA (0.74) DGKANAAAPRSS1PRSS2PRSS3
SCHEMBL17123131 0.98 DGKA (0.74) DGKANAAAPRSS1PRSS2PRSS3
SCHEMBL15027500 0.98 DGKA (0.74) DGKANAAAPRSS1PRSS2PRSS3
SCHEMBL8772076 0.98 DGKA (0.74) DGKANAAAPRSS1PRSS2PRSS3
SCHEMBL11877869 0.98 DGKA (0.74) DGKANAAAPRSS1PRSS2PRSS3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111253577-A Method for preparing modified epoxy acrylate 黎明化工研究设计院有限责任公司 2020-06-09 CN claimed
CN-101268111-B Polymer material, foam obtained from same, and polishing pad using those KURARAY CO 2012-07-18 CN claimed
CN-101268111-A Polymer material, foam obtained from same, and polishing pad using those KURARAY CO (JP) 2008-09-17 CN claimed
CN-101268111-B Polymer material, foam obtained from same, and polishing pad using those KURARAY CO 2012-07-18 CN disclosed
CN-102046737-A Inkjet recording ink and image forming method RICOH KK 2011-05-04 CN disclosed
CN-101268111-A Polymer material, foam obtained from same, and polishing pad using those KURARAY CO (JP) 2008-09-17 CN disclosed