Fluoride

Fluoride

SCHEMBL27740263

CCCCCCC=C(CC(C)O)C(=O)O.F

nearest known ligand 0.55

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GRIK1 P39086 2/20 0.55
EP300 Q09472 1/20 0.53
GRIK2 Q13002 1/20 0.46
GPR84 Q9NQS5 4/20 0.40
TERT O14746 3/20 0.40
PTPN1 P18031 3/20 0.40
MAPT P10636 2/20 0.40
BLM P54132 2/20 0.40
HSD17B10 Q99714 2/20 0.40
FABP4 P15090 2/20 0.40
PPARG P37231 2/20 0.40
PPARD Q03181 2/20 0.40
PPARA Q07869 2/20 0.40
GMNN O75496 1/20 0.40
USP2 O75604 1/20 0.40
LMNA P02545 1/20 0.40
CYP1A2 P05177 1/20 0.40
POLB P06746 1/20 0.40
CYP2C9 P11712 1/20 0.40
ALOX15 P16050 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5187449 0.91 GRIK1 (0.65) GRIK1EP300GRIK2GPR84F7
SCHEMBL8764538 0.86 GRIK1 (0.58) GRIK1EP300GRIK2TERTPTPN1
SCHEMBL8764536 0.86 GRIK1 (0.58) GRIK1EP300GRIK2TERTPTPN1
Ether SCHEMBL28065387 0.84 GRIK1 (0.56) GRIK1EP300GRIK2GPR84MAPT
SCHEMBL28621414 0.82 GRIK1 (0.54) GRIK1EP300GRIK2GPR84MAPT
SCHEMBL28621418 0.82 GRIK1 (0.54) GRIK1EP300GRIK2GPR84MAPT
SCHEMBL27636120 0.82 GRIK1 (0.54) GRIK1EP300GRIK2GPR84MAPT
SCHEMBL28626388 0.82 GRIK1 (0.54) GRIK1EP300GRIK2GPR84MAPT
SCHEMBL6942687 0.82 GRIK1 (0.54) GRIK1EP300GRIK2GPR84MAPT
SCHEMBL2977597 0.78 EP300 (0.64) GRIK1EP300TERTPTPN1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100465784-C Radiation-sensitive composition, pattern forming method, and method for manufacturing semiconductor device HITACHI LTD (JP) 2009-03-04 CN disclosed