SCHEMBL277485

SCHEMBL277485

CCC=C(C=CC(=O)O)C(=O)O

nearest known ligand 0.46

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 7/20 0.46
TSHR P16473 3/20 0.43
TP53 P04637 1/20 0.43
EGLN1 Q9GZT9 1/20 0.43
EGLN3 Q9H6Z9 1/20 0.43
GRIK1 P39086 1/20 0.35
GRIK2 Q13002 1/20 0.35
PPARA Q07869 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.32
ALDH1A1 P00352 2/20 0.32
GAA P10253 1/20 0.32
ALOX15 P16050 1/20 0.32
RECQL P46063 1/20 0.32
HSD17B10 Q99714 1/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5936794 0.81 GRIK1 (0.35) HCAR2GRIK1GRIK2
SCHEMBL29954137 0.81 GRIK1 (0.35) HCAR2GRIK1GRIK2
SCHEMBL5936792 0.81 GRIK1 (0.35) HCAR2GRIK1GRIK2
SCHEMBL28175848 0.80 GRIK1 (0.32) GRIK1GRIK2
SCHEMBL1900808 0.79 HCAR2 (0.48) HCAR2TSHRTP53EGLN1EGLN3
Fumaric Acid SCHEMBL7518280 0.76 TSHR (0.43) HCAR2TSHRTP53EGLN1EGLN3
SCHEMBL17324908 0.76 TSHR (0.43) HCAR2TSHRTP53EGLN1EGLN3
Maleic Acid SCHEMBL8953192 0.76 TSHR (0.43) HCAR2TSHRTP53EGLN1EGLN3
SCHEMBL14861215 0.76 GABRR1 (0.48) HCAR2TSHRTP53EGLN1EGLN3
SCHEMBL14861216 0.76 GABRR1 (0.48) HCAR2TSHRTP53EGLN1EGLN3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115064777-A Gel electrolyte for lithium metal and preparation method and application thereof 福州大学 2022-09-16 CN claimed
CN-114976236-A Flame-retardant gel electrolyte for lithium metal and preparation method and application thereof 福州大学 2022-08-30 CN claimed
CN-105543973-B Preparation method and application of inorganic-organic composite inverse opal structure photonic crystal with evolvable morphology 中国科学院理化技术研究所 2018-12-25 CN claimed
CN-108276865-A Corrosion resistance and the excellent application composition of lubricity and utilize its coated steel plates POSCO公司 2018-07-13 CN claimed
CN-105543973-A Preparation method and application of inorganic-organic composite inverse opal structure photonic crystal with evolvable morphology TECHNICAL INST PHYSICS & CHEMISTRY CAS 2016-05-04 CN claimed
EP-2104692-B1 METHACRYLATE RESIN WITH EXCELLENT DISCOLORATION-RESISTANCE AND TRANSPARENCY AND METHOD FOR PREPARING THE SAME CHEIL IND INC (KR) 2012-08-08 EP claimed
US-8133958-B2 Prepared by suspension polymerization, during which a polyalkylacrylate-acrylic acid is introduced as a suspension stabilizer; excellent flowability, mechanical properties such as strength, rigidity CHEIL INDUSTRIES INC. (KR) 2012-03-13 US claimed
EP-2104692-A1 METHACRYLATE RESIN WITH EXCELLENT DISCOLORATION-RESISTANCE AND TRANSPARENCY AND METHOD FOR PREPARING THE SAME Cheil Industries Inc. (KR) 2009-09-30 EP claimed
WO-2008078918-A1 METHACRYLATE RESIN WITH EXCELLENT DISCOLORATION-RESISTANCE AND TRANSPARENCY AND METHOD FOR PREPARING THE SAME CHEIL INDUSTRIES INC. (KR) 2008-07-03 WO claimed
US-20080154008-A1 Methacrylate Resin with Excellent Discoloration-Resistance and Transparency and Method for Preparing the Same CHEIL INDUSTRIES INC. (KR) 2008-06-26 US claimed
EP-0005618-B1 DEODORANT PRODUCTS, PREPARATION AND USE THEREOF UNILEVER PLC (GB) 1982-06-09 EP claimed
EP-0005618-A1 Deodorant products, preparation and use thereof UNILEVER PLC (GB) 1979-11-28 EP claimed
CN-115064777-B Gel electrolyte for lithium metal and preparation method and application thereof 福州大学 2024-07-05 CN disclosed
US-20230073124-A1 MATTING AGENT INCLUDING POLYMER PARTICLES, MATTING POLYMER COMPOSITION INCLUDING MATTING AGENT, AND METHOD OF PRODUCING POLYMER PARTICLES HANNANOTECH CO., LTD. (KR) 2023-03-09 US disclosed
CN-115725014-A Matting agent comprising polymer particles, matting polymer composition comprising the matting agent, and method for producing the same 韩纳米技术株式会社 2023-03-03 CN disclosed
CN-115064777-A Gel electrolyte for lithium metal and preparation method and application thereof 福州大学 2022-09-16 CN disclosed
US-5576441-A STORAGE STABILITY; DISCOLORATION INHIBITION FUJI PHOTO FILM CO., LTD. (JP) 1996-11-19 US disclosed
EP-0700909-A1 Photosensitive bis(halomethyloxadiazole) compound and photosensitive transfer sheet using the same FUJI PHOTO FILM CO., LTD. (JP) 1996-03-13 EP disclosed
WO-1995002021-A1 PRE-PASTED WALL COVERINGS AND THEIR PRODUCTION ALLIED COLLOIDS LIMITED (GB) 1995-01-19 WO disclosed
US-3989732-A Photosensitive copper (I) complexes EASTMAN KODAK COMPANY (US) 1976-11-02 US disclosed