SCHEMBL27760428

SCHEMBL27760428

C=CCC=CC=CC.[Ru]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL999913 0.97
SCHEMBL999912 0.97
SCHEMBL28162925 0.94 ALDH1A1 (0.35)
SCHEMBL27583115 0.94 ALDH1A1 (0.35)
Pyrrole SCHEMBL27742686 0.89
SCHEMBL15548152 0.87
Pyrrole SCHEMBL27975210 0.85
Pyrrole SCHEMBL27763241 0.83
SCHEMBL27742667 0.82
SCHEMBL19736143 0.82 TSHR (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103215570-A Method and apparatus for photo-excitation of chemicals for atomic layer deposition of dielectric film APPLIED MATERIALS INC 2013-07-24 CN disclosed
CN-101438391-B Method and apparatus for photo-excitation of chemicals for atomic layer deposition of dielectric films APPLIED MATERIALS INC 2013-04-10 CN disclosed
CN-101448977-B Apparatus and process for plasma-enhanced atomic layer deposition APPLIED MATERIALS INC 2010-12-15 CN disclosed
CN-101448977-A Apparatus and process for plasma-enhanced atomic layer deposition APPLIED MATERIALS INC (US) 2009-06-03 CN disclosed
CN-101438391-A Method and apparatus for photo-excitation of chemicals for atomic layer deposition of dielectric films APPLIED MATERIALS INC (US) 2009-05-20 CN disclosed