SCHEMBL2776110

SCHEMBL2776110

CCC(C)CCC(O)(C#CC(O)(CC)CCC(C)CC)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL48838 0.77
SCHEMBL28285276 0.74
SCHEMBL4891764 0.74 TSHR (0.33)
SCHEMBL295787 0.73 MEN1 (0.31)
SCHEMBL8574085 0.72 MEN1 (0.32)
SCHEMBL5370214 0.72 ALDH1A1 (0.45)
SCHEMBL24488824 0.70
Oxirane SCHEMBL23090931 0.69
SCHEMBL395580 0.69 TSHR (0.31)
SCHEMBL26106413 0.68 MEN1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9899123-B2 Nanowires-based transparent conductors PINE CASTLE INVESTMENTS LIMITED (VG) 2018-02-20 US claimed
US-8865027-B2 Nanowires-based transparent conductors CAMBRIOS TECHNOLOGIES CORPORATION (US) 2014-10-21 US claimed
US-7429293-B2 High gloss high gamut pigment inkjet ink FUNAI ELECTRIC CO., LTD (JP) 2008-09-30 US claimed
WO-2007084329-A2 HIGH GLOSS HIGH GAMUT PIGMENT INKJET INK LEXMARK INTERNATIONAL, INC. (US) 2007-07-26 WO claimed
US-20070163468-A1 High gloss high gamut pigment inkjet ink LEXMARK INTERNATIONAL, INC. 2007-07-19 US claimed
CN-111886301-B White ink, ink set and recording method 日本化药株式会社 2023-01-06 CN disclosed
US-11401430-B2 White ink, ink set, and recording method NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2022-08-02 US disclosed
US-20210363367-A1 WHITE INK, INK SET, AND RECORDING METHOD NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2021-11-25 US disclosed
EP-3778796-A1 WHITE INK, INK SET, AND RECORDING METHOD Nippon Kayaku Kabushiki Kaisha (JP) 2021-02-17 EP disclosed
CN-111886301-A White ink, ink set and recording method 日本化药株式会社 2020-11-03 CN disclosed
US-7785462-B2 Separating compositions and methods of use VARY PETROCHEM, LLC (US) 2010-08-31 US disclosed
WO-2007084329-A3 HIGH GLOSS HIGH GAMUT PIGMENT INKJET INK LEXMARK INT INC (US) 2008-11-20 WO disclosed
US-7429293-B2 High gloss high gamut pigment inkjet ink FUNAI ELECTRIC CO., LTD (JP) 2008-09-30 US disclosed
US-7429293-B2 High gloss high gamut pigment inkjet ink FUNAI ELECTRIC CO., LTD (JP) 2008-09-30 US disclosed
WO-2007084329-A2 HIGH GLOSS HIGH GAMUT PIGMENT INKJET INK LEXMARK INTERNATIONAL, INC. (US) 2007-07-26 WO disclosed
WO-2007084329-A2 HIGH GLOSS HIGH GAMUT PIGMENT INKJET INK LEXMARK INTERNATIONAL, INC. (US) 2007-07-26 WO disclosed
US-20070163468-A1 High gloss high gamut pigment inkjet ink LEXMARK INTERNATIONAL, INC. 2007-07-19 US disclosed
US-20070163468-A1 High gloss high gamut pigment inkjet ink LEXMARK INTERNATIONAL, INC. 2007-07-19 US disclosed