⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10991515 | 0.83 | — | — | |
| SCHEMBL15353 | 0.82 | — | — | |
| SCHEMBL15352 | 0.82 | — | — | |
| SCHEMBL12973059 | 0.82 | — | — | |
| SCHEMBL265515 | 0.80 | — | — | |
| SCHEMBL11465249 | 0.80 | — | — | |
| SCHEMBL453106 | 0.80 | — | — | |
| SCHEMBL19974831 | 0.80 | TSHR (0.44) | — | |
| SCHEMBL9446891 | 0.78 | — | — | |
| SCHEMBL6265115 | 0.78 | GABRR1 (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10126653-B2 | Pattern forming method and resist composition | FUJIFILM CORPORATION (JP) | 2018-11-13 | — | — | US | disclosed |
| US-9551931-B2 | Method of forming pattern, actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, process for manufacturing electronic device and electronic device | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| US-9551928-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern therewith | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| US-20160004157-A1 | METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-01-07 | — | — | US | disclosed |
| US-9081277-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-07-14 | — | — | US | disclosed |
| US-20150118621-A1 | METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2015-04-30 | — | — | US | disclosed |
| US-9017917-B2 | Resist composition and method of forming pattern therewith | FUJIFILM CORPORATION (JP) | 2015-04-28 | — | — | US | disclosed |
| US-20150111157-A1 | METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2015-04-23 | — | — | US | disclosed |
| US-8808961-B2 | Composition, resist film, pattern forming method, and inkjet recording method | FUJIFILM CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| WO-2014007361-A1 | METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2014-01-09 | — | — | WO | disclosed |
| US-20070196766-A1 | Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-08-23 | — | — | US | disclosed |
| US-20070184384-A1 | Novel sulfonium compound, photosensitive composition containing the compound and pattern-forming method using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-08-09 | — | — | US | disclosed |
| US-20070172769-A1 | Pattern forming method | FUJIFILM CORPORATION (JP) | 2007-07-26 | — | — | US | disclosed |
| US-20070172768-A1 | Pattern forming method | FUJIFILM CORPORATION (JP) | 2007-07-26 | — | — | US | disclosed |
| US-20060210919-A1 | Photosensitive composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2006-09-21 | — | — | US | disclosed |
| US-20060204890-A1 | Positive photosensitive composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2006-09-14 | — | — | US | disclosed |
| US-20060040208-A1 | Chemical amplification resist composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2006-02-23 | — | — | US | disclosed |
| US-20050277059-A1 | Protective film-forming composition for immersion exposure and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2005-12-15 | — | — | US | disclosed |
| US-20050266336-A1 | Photosensitive composition and pattern-forming method using the photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2005-12-01 | — | — | US | disclosed |
| US-20040191676-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2004-09-30 | — | — | US | disclosed |