Methylamine

Methylamine

SCHEMBL27770374

CCCCc1ccccc1CCCC.CN

nearest known ligand 0.54

Full drug profile on Sugi Atlas →

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
LIPG Q9Y5X9 1/20 0.52
TLR8 Q9NR97 2/20 0.48
CYP3A4 P08684 1/20 0.47
CYP2D6 P10635 1/20 0.47
CYP2C9 P11712 1/20 0.47
TYR P14679 1/20 0.43
NR1H2 P55055 1/20 0.42
NR1H3 Q13133 1/20 0.42
ALOX5 P09917 1/20 0.41
PTGS2 P35354 1/20 0.41
CTRC Q99895 1/20 0.39
TAAR1 Q96RJ0 1/20 0.39
BID P55957 1/20 0.39
BCL2L1 Q07817 1/20 0.39
MCL1 Q07820 1/20 0.39
BAK1 Q16611 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29520482 0.95 LIPG (0.56) LIPGTLR8CYP3A4CYP2D6CYP2C9
SCHEMBL245188 0.95 LIPG (0.56) LIPGTLR8CYP3A4CYP2D6CYP2C9
SCHEMBL29414141 0.92 LIPG (0.54) LIPGTLR8CYP3A4CYP2D6CYP2C9
Benzene SCHEMBL3118223 0.92 LIPG (0.54) LIPGTLR8CYP3A4CYP2D6CYP2C9
Ammonia Solution, Strong SCHEMBL28991000 0.92 LIPG (0.54) LIPGTLR8CYP3A4CYP2D6CYP2C9
Water SCHEMBL28085345 0.92 LIPG (0.54) LIPGTLR8CYP3A4CYP2D6CYP2C9
SCHEMBL2049761 0.92 LIPG (0.54) LIPGTLR8CYP3A4CYP2D6CYP2C9
Hydrogen Sulfide SCHEMBL28851632 0.92 LIPG (0.54) LIPGTLR8CYP3A4CYP2D6CYP2C9
SCHEMBL29868104 0.90 LIPG (0.63) LIPGTLR8CYP3A4CYP2D6CYP2C9
SCHEMBL6680871 0.90 LIPG (0.52) LIPGTLR8CYP3A4CYP2D6CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106415796-B Mixed abrasive tungsten chemical mechanical polishing composition 嘉柏微电子材料股份公司 2019-06-25 CN disclosed
CN-106661430-B tungsten chemical mechanical polishing composition 嘉柏微电子材料股份公司 2019-03-19 CN disclosed
CN-106414650-B Mixed abrasive tungsten chemical mechanical polishing composition 嘉柏微电子材料股份公司 2019-02-15 CN disclosed
CN-106661430-A tungsten chemical mechanical polishing composition 嘉柏微电子材料股份公司 2017-05-10 CN disclosed
CN-106414650-A Mixed abrasive tungsten chemical mechanical polishing composition 嘉柏微电子材料股份公司 2017-02-15 CN disclosed
CN-106415796-A Mixed abrasive tungsten chemical mechanical polishing composition 嘉柏微电子材料股份公司 2017-02-15 CN disclosed
CN-101646492-B DMC catalyst, method for the production thereof and use thereof BASF SE 2013-06-05 CN disclosed
CN-101646492-A DMC catalyst, method for the production thereof and use thereof BASF SE DE 2010-02-10 CN disclosed
CN-101546887-A Method for realizing laser emission conversion on organic crystal frequency through multi-photon pumping UNIV JILIN 2009-09-30 CN disclosed