SCHEMBL27822012

SCHEMBL27822012

CCN(CC)c1ccc(C=CC2CCC(=O)CC2)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 11/20 0.53
▸ ALDH3A1 P30838 1/20 0.53
▸ ALDH1A3 P47895 1/20 0.53
▸ MEN1 O00255 8/20 0.50
▸ KMT2A Q03164 8/20 0.50
▸ MAPT P10636 7/20 0.50
▸ LMNA P02545 4/20 0.50
▸ RAB9A P51151 3/20 0.45
▸ KDM4E B2RXH2 3/20 0.44
▸ GAA P10253 2/20 0.44
▸ RECQL P46063 3/20 0.43
▸ MAPK1 P28482 3/20 0.43
▸ POLB P06746 2/20 0.43
▸ TLR9 Q9NR96 2/20 0.43
▸ TDP1 Q9NUW8 2/20 0.43
▸ USP2 O75604 1/20 0.43
▸ L3MBTL1 Q9Y468 1/20 0.43
▸ GSK3B P49841 1/20 0.43
▸ NPSR1 Q6W5P4 3/20 0.43
▸ HPGD P15428 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27440533 0.83 CYP2A6 (0.50) ALDH1A1MEN1KMT2AMAPTLMNA
SCHEMBL8447577 0.79 MAOB (0.40) MAOB
SCHEMBL8447581 0.79 MAOB (0.40) MAOB
SCHEMBL8171052 0.76 ALDH1A1 (0.71) ALDH1A1ALDH3A1ALDH1A3MEN1KMT2A
SCHEMBL2298605 0.76 ALDH1A1 (0.71) ALDH1A1ALDH3A1ALDH1A3MEN1KMT2A
SCHEMBL2298602 0.76 ALDH1A1 (0.71) ALDH1A1ALDH3A1ALDH1A3MEN1KMT2A
SCHEMBL8171054 0.76 ALDH1A1 (0.71) ALDH1A1ALDH3A1ALDH1A3MEN1KMT2A
SCHEMBL11114772 0.76 ALDH1A1 (0.47) ALDH1A1ALDH3A1ALDH1A3MEN1KMT2A
SCHEMBL10703642 0.74 ALDH1A1 (0.49) ALDH1A1ALDH3A1ALDH1A3MEN1KMT2A
SCHEMBL21591022 0.73 ALDH1A1 (0.88) ALDH1A1ALDH3A1ALDH1A3MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107850844-A Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2018-03-27 — — CN disclosed
CN-105785713-A Photosensitive resin composition, dry film, cured product, electronic component or optical product and adhesive 太阳控股株式会社 2016-07-20 — — CN disclosed
CN-104285184-A Negative photosensitive resin composition, method for producing cured relief pattern, and semiconductor device ASAHI KASEI E MATERIALS CORP 2015-01-14 — — CN disclosed
CN-102375336-B Manufacturing method of photosensitive resin composition and solidified embossing pattern, and semiconductor device ASAHI KASEI E MATERIALS CORP 2013-10-09 — — CN disclosed
CN-102162996-B Manufacture method for negative type photosensitive resin composition and cured relief pattern ASAHI KASEI E MATERIALS CORP 2013-07-17 — — CN disclosed
CN-101965542-B Photosensitive polyorganosiloxane composition ASAHI KASEI E MATERIALS CORP 2013-03-27 — — CN disclosed
CN-102902162-A Photosensitive resin composition ASAHI KASEI E MATERIALS CORP 2013-01-30 — — CN disclosed
CN-102375336-A Manufacturing Method Of Photosensitive Resin Composition And Solidified Embossing Pattern, And Semiconductor Device ASAHI KASEI E MATERIALS CORP 2012-03-14 — — CN disclosed
CN-102162996-A Manufacture method for negative type photosensitive resin composition and cured relief pattern ASAHI KASEI E MATERIALS CORP 2011-08-24 — — CN disclosed
CN-101965542-A Photosensitive polyorganosiloxane composition ASAHI KASEI E MATERIALS CORP 2011-02-02 — — CN disclosed
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