Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ERN1 | O75460 | 6/20 | 0.86 |
| ▸ | MAPT | P10636 | 8/20 | 0.55 |
| ▸ | KMT2A | Q03164 | 7/20 | 0.55 |
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.55 |
| ▸ | MEN1 | O00255 | 6/20 | 0.55 |
| ▸ | L3MBTL1 | Q9Y468 | 6/20 | 0.55 |
| ▸ | THRB | P10828 | 3/20 | 0.55 |
| ▸ | GAA | P10253 | 3/20 | 0.55 |
| ▸ | POLB | P06746 | 1/20 | 0.55 |
| ▸ | BLM | P54132 | 1/20 | 0.55 |
| ▸ | CASP6 | P55212 | 1/20 | 0.55 |
| ▸ | NPC1 | O15118 | 3/20 | 0.54 |
| ▸ | HTT | P42858 | 2/20 | 0.54 |
| ▸ | RRM1 | P23921 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.50 |
| ▸ | HPGD | P15428 | 2/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | RAB9A | P51151 | 1/20 | 0.50 |
| ▸ | HKDC1 | Q2TB90 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29358409 | 0.93 | ERN1 (1.00) | ERN1MAPTKMT2AKDM4EMEN1 | |
| SCHEMBL304032 | 0.93 | ERN1 (1.00) | ERN1MAPTKMT2AKDM4EMEN1 | |
| SCHEMBL11407376 | 0.91 | ERN1 (0.96) | ERN1MAPTKMT2AKDM4EMEN1 | |
| SCHEMBL28033846 | 0.91 | ERN1 (0.96) | ERN1MAPTKMT2AKDM4EMEN1 | |
| SCHEMBL11520332 | 0.91 | ERN1 (0.96) | ERN1MAPTKMT2AKDM4EMEN1 | |
| Hydrazine SCHEMBL28732767 | 0.89 | ERN1 (0.92) | ERN1MAPTKMT2AKDM4EMEN1 | |
| Alcohol SCHEMBL28080354 | 0.84 | ERN1 (0.83) | ERN1MAPTKMT2AKDM4EMEN1 | |
| SCHEMBL10615396 | 0.84 | ERN1 (0.82) | ERN1MAPTKMT2AKDM4EMEN1 | |
| Acetonitrile SCHEMBL28309194 | 0.83 | ERN1 (0.80) | ERN1MAPTKMT2AKDM4EMEN1 | |
| Orthocresol SCHEMBL2131451 | 0.81 | ERN1 (0.77) | ERN1MAPTKMT2AKDM4EMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114516863-B | Imide sulfonate photoacid generator with high acid yield, composition and application | 常州强力电子新材料股份有限公司 | 2024-06-21 | — | — | CN | disclosed |
| CN-115368285-B | oxime sulfonate photoacid generator with high acid yield | 常州强力先端电子材料有限公司 | 2024-03-26 | — | — | CN | disclosed |
| CN-115368286-B | Oxime sulfonate photoacid generator with high acid yield | 常州强力先端电子材料有限公司 | 2024-03-22 | — | — | CN | disclosed |
| CN-115368287-B | I-line oxime sulfonate photoacid generator with high acid yield | 常州强力先端电子材料有限公司 | 2024-03-19 | — | — | CN | disclosed |
| CN-115368340-B | Oxime sulfonate photoacid generator, resist composition containing oxime sulfonate photoacid generator, electronic device and application of oxime sulfonate photoacid generator | 常州强力先端电子材料有限公司 | 2024-01-26 | — | — | CN | disclosed |
| CN-115368341-B | Oxime sulfonate compound, resist composition containing oxime sulfonate compound, electronic device and application of oxime sulfonate compound | 常州强力先端电子材料有限公司 | 2024-01-26 | — | — | CN | disclosed |
| CN-116283945-A | Imide sulfonate photoacid generator, resist composition, application thereof and electronic component | 瑞红(苏州)电子化学品股份有限公司 | 2023-06-23 | — | — | CN | disclosed |
| CN-115745865-A | Imide sulfonate photoacid, resist composition, electronic device, and application | 常州强力电子新材料股份有限公司 | 2023-03-07 | — | — | CN | disclosed |
| CN-115650886-A | Oxime sulfonate photoacid generators and use of resist compositions | 瑞红(苏州)电子化学品股份有限公司 | 2023-01-31 | — | — | CN | disclosed |
| CN-115611782-A | High-acid-production oxime sulfonate photoacid generator and application of resist composition thereof | 瑞红(苏州)电子化学品股份有限公司 | 2023-01-17 | — | — | CN | disclosed |
| CN-115368287-A | I-line oxime sulfonate photo-acid generator with high acid yield | 常州强力先端电子材料有限公司 | 2022-11-22 | — | — | CN | disclosed |
| CN-115368341-A | Oxime sulfonate compound, resist composition containing the same, electronic device and use | 常州强力先端电子材料有限公司 | 2022-11-22 | — | — | CN | disclosed |
| CN-115109046-A | Imide sulfonate photo-acid generator with high acid yield, composition and application | 常州强力先端电子材料有限公司 | 2022-09-27 | — | — | CN | disclosed |
| CN-114516863-A | Imide sulfonate photo-acid generator with high acid yield, composition and application | 常州强力电子新材料股份有限公司 | 2022-05-20 | — | — | CN | disclosed |
| US-8309295-B2 | Photosensitive insulating resin composition, hardening product thereof, and circuit board equipped therewith | JSR CORPORATION (JP) | 2012-11-13 | — | — | US | disclosed |
| US-20100276186-A1 | PHOTOSENSITIVE INSULATING RESIN COMPOSITION, HARDENING PRODUCT THEREOF, AND CIRCUIT BOARD EQUIPPED THEREWITH | JSR CORPORATION (JP) | 2010-11-04 | — | — | US | disclosed |
| US-7714033-B2 | Photosensitive insulating resin composition, cured product thereof and electronic component comprising the same | JSR CORPORATION (JP) | 2010-05-11 | — | — | US | disclosed |
| EP-1892574-A1 | Photosensitive insulating resin composition, cured product thereof and electronic component having the same | JSR Corporation (JP) | 2008-02-27 | — | — | EP | disclosed |
| US-20080045621-A1 | PHOTOSENSITIVE INSULATING RESIN COMPOSITION, CURED PRODUCT THEREOF AND ELECTRONIC COMPONENT COMPRISING THE SAME | JSR CORPORATION (JP) | 2008-02-21 | — | — | US | disclosed |
| US-20040110084-A1 | Photosensitive insulating resin composition and cured product thereof | JSR CORPORATION (JP) | 2004-06-10 | — | — | US | disclosed |