SCHEMBL2790728

SCHEMBL2790728

COC(C)OCCN

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22531379 1.00
SCHEMBL20840050 0.85
SCHEMBL4369249 0.85
SCHEMBL1535731 0.85 LMNA (0.42)
SCHEMBL2128080 0.84
Hydrochloric Acid SCHEMBL18059974 0.82 LMNA (0.40)
SCHEMBL11021303 0.82 LMNA (0.37)
SCHEMBL28915075 0.81
SCHEMBL6677962 0.80 LMNA (0.32)
SCHEMBL11897832 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 149 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109071576-A Silsesquioxane resin and an oxaamine composition 美国陶氏有机硅公司 2018-12-21 CN claimed
US-20250224675-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2025-07-10 US disclosed
US-11780946-B2 Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-10-10 US disclosed
US-11709425-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-25 US disclosed
US-11703756-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-18 US disclosed
US-20230210735-A1 PREVENTION, REDUCTION, OR AMELIORATION OF OLD PERSON SMELL FIRMENICH SA (CH) 2023-07-06 US disclosed
US-11650497-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-05-16 US disclosed
US-11635686-B2 Resist composition, method of forming resist pattern, and compound TOKYO OHKA KOGYO CO., LTD. (JP) 2023-04-25 US disclosed
US-11586111-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-02-21 US disclosed
US-11448963-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOG YO CO., LTD. (JP) 2022-09-20 US disclosed
US-5866717-A Metalloproteinase inhibitors BRITISH BIOTECH PHARMACEUTICALS LIMITED (GB) 1999-02-02 US disclosed
CN-1176955-A Preparation method of methylene bridged dicyclic pentadienyl compound HOECHST AG (DE) 1998-03-25 CN disclosed
EP-0793641-A1 METALLOPROTEINASE INHIBITORS BRITISH BIOTECH PHARMACEUTICALS LIMITED (GB) 1997-09-10 EP disclosed
CN-1148038-A Process for synthesizing carbon-bridged dicyclic pentylene compound HOECHST AG (DE) 1997-04-23 CN disclosed
CN-1032359-C Process for producing 3-hydroxymethyl-1-propargylimidazolidine-2,4-dione SUMITOMO CHEMICAL CO (JP) 1996-07-24 CN disclosed
WO-1996016931-A1 METALLOPROTEINASE INHIBITORS BRITISH BIOTECH PHARMACEUTICALS LIMITED (GB) 1996-06-06 WO disclosed
CN-1086825-A Three ring and tetracyclic compounds HOFFMANN LA ROCHE (CH) 1994-05-18 CN disclosed
CN-1078463-A 3-methylol-1-propargy limidazolidine-2, the preparation method of 4-diketone SUMITOMO CHEMICAL CO (JP) 1993-11-17 CN disclosed
CN-1022183-C Process for preparing quinolone carboxylic acid intermediates PRIZER INC (US) 1993-09-22 CN disclosed
CN-1042906-A The method for preparing the Quinolonecar boxylic acid intermediate PFIZER (US) 1990-06-13 CN disclosed