SCHEMBL27920161

SCHEMBL27920161

CCC=CC(CC(C)OCC1CO1)[Si](OC)(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27902470 0.88
SCHEMBL27920171 0.82 ALDH1A1 (0.38)
SCHEMBL15065344 0.79 SMN1; SMN2 (0.32)
SCHEMBL15065343 0.79 SMN1; SMN2 (0.32)
SCHEMBL5598253 0.76 ALDH1A1 (0.33)
SCHEMBL27902424 0.74 ALDH1A1 (0.30)
SCHEMBL27902471 0.73
SCHEMBL6303425 0.72 ALDH1A1 (0.43)
SCHEMBL28021434 0.71 ALDH1A1 (0.34)
SCHEMBL27902411 0.71 ALDH1A1 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103097954-A Positive photosensitive resin composition, method of creating resist pattern, and electronic component HITACHI CHEMICAL CO LTD 2013-05-08 CN disclosed