⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27902423 | 0.88 | — | — | |
| SCHEMBL15065173 | 0.81 | SMN1; SMN2 (0.30) | — | |
| SCHEMBL15065172 | 0.81 | SMN1; SMN2 (0.30) | — | |
| SCHEMBL27920181 | 0.78 | ALDH1A1 (0.33) | — | |
| SCHEMBL5598865 | 0.76 | ALDH1A1 (0.33) | — | |
| SCHEMBL27902439 | 0.75 | — | — | |
| SCHEMBL27902466 | 0.75 | — | — | |
| SCHEMBL27902403 | 0.74 | ALDH1A1 (0.33) | — | |
| SCHEMBL15064806 | 0.72 | SMN1; SMN2 (0.32) | — | |
| SCHEMBL15064804 | 0.72 | SMN1; SMN2 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103097954-A | Positive photosensitive resin composition, method of creating resist pattern, and electronic component | HITACHI CHEMICAL CO LTD | 2013-05-08 | — | — | CN | disclosed |