SCHEMBL27923922

SCHEMBL27923922

Fc1c(F)c(F)c(O[SiH3])c(F)c1F

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CA9 Q16790 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1157893 0.67 CA1 (0.38) CA1CA2CA9
SCHEMBL19186321 0.67 CA1 (0.38) CA1CA2CA9
SCHEMBL2001423 0.67 CA1 (0.38) CA1CA2CA9
SCHEMBL5950956 0.64 CA1 (0.36) CA1CA2CA9
SCHEMBL265766 0.64 CA1 (0.36) CA1CA2CA9
SCHEMBL42968 0.62 GRIN2D (0.33) CA1CA2
SCHEMBL13918057 0.61 CA1 (0.35) CA1CA2CA9
SCHEMBL182607 0.61 HSD17B10 (0.40) CA1CA2CA9
SCHEMBL20858492 0.61 CA1 (0.35) CA1CA2CA9
SCHEMBL19257960 0.61 CA1 (0.41) CA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101641767-B Silicon dielectric treating agent for use after etching, process for producing semiconductor device, and semiconductor device FUJITSU LTD 2013-10-30 CN disclosed