SCHEMBL27923946

SCHEMBL27923946

CCCC[Si](C)(C)CCC

nearest known ligand 0.38

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.38
LMNA P02545 1/20 0.38
THRB P10828 1/20 0.35
ALDH1A1 P00352 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11418684 0.93 TSHR (0.43) TSHRLMNATHRBALDH1A1TDP1
SCHEMBL11431867 0.87 TSHR (0.44) TSHRLMNATHRBALDH1A1
SCHEMBL1107764 0.86
SCHEMBL27093902 0.84 TSHR (0.50) TSHRLMNATHRBALDH1A1
SCHEMBL2791955 0.83 TSHR (0.47) TSHRLMNATHRBALDH1A1
SCHEMBL1889268 0.82
SCHEMBL13881265 0.81 TSHR (0.33) TSHRLMNATHRB
SCHEMBL14492552 0.81 TSHR (0.33) TSHRLMNATHRB
SCHEMBL19119178 0.80 TSHR (0.53) TSHRLMNATHRBALDH1A1
SCHEMBL1104735 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101641767-B Silicon dielectric treating agent for use after etching, process for producing semiconductor device, and semiconductor device FUJITSU LTD 2013-10-30 CN disclosed