SCHEMBL1107764

SCHEMBL1107764

CCC[Si](C)(C)CCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1889268 0.96
Dimethylamine SCHEMBL8207427 0.89
SCHEMBL27923946 0.86 TSHR (0.38)
SCHEMBL12361970 0.84
SCHEMBL4849944 0.84
SCHEMBL5846089 0.83
SCHEMBL3672238 0.78 DNM1 (0.41)
SCHEMBL6277887 0.78
SCHEMBL10711374 0.78
SCHEMBL2005777 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240173235-A1 PERSONAL CARE COMPOSITIONS COMPRISING SILAHYDROCARBONS MOMENTIVE PERFORMANCE MATERIALS INC. 2024-05-30 US claimed
EP-4322915-A1 PERSONAL CARE COMPOSITIONS COMPRISING SILAHYDROCARBONS Momentive Performance Materials Inc. (US) 2024-02-21 EP claimed
CN-117425467-A Personal care compositions comprising silicone based 迈图高新材料公司 2024-01-19 CN claimed
WO-2022221354-A1 PERSONAL CARE COMPOSITIONS COMPRISING SILAHYDROCARBONS MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2022-10-20 WO claimed
US-8822619-B1 Directed self assembly copolymer composition and related methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-09-02 US claimed
US-8822615-B1 Block copolymer composition and methods relating thereto ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-09-02 US claimed
US-20140227445-A1 Directed self assembly copolymer composition and related methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-08-14 US claimed
US-20140227448-A1 Block copolymer composition and methods relating thereto ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-08-14 US claimed
US-6436824-B1 Low dielectric constant materials for copper damascene CHARTERED SEMICONDUCTOR MANUFACTURING LTD. (SG) 2002-08-20 US claimed
WO-2000050478-A1 NOVEL FORMULATIONS OF ALKYLLITHIUMS WITH IMPROVED THERMAL STABILITY, PROCESSES TO PRODUCE THESE FORMULATIONS AND PROCESSES FOR USING THE SAME TO IMPROVE STABILITY OF LIVING POLYMER CHAIN ENDS FMC CORPORATION (US) 2000-08-31 WO claimed
US-20240173235-A1 PERSONAL CARE COMPOSITIONS COMPRISING SILAHYDROCARBONS MOMENTIVE PERFORMANCE MATERIALS INC. 2024-05-30 US disclosed
EP-4322915-A1 PERSONAL CARE COMPOSITIONS COMPRISING SILAHYDROCARBONS Momentive Performance Materials Inc. (US) 2024-02-21 EP disclosed
CN-117425467-A Personal care compositions comprising silicone based 迈图高新材料公司 2024-01-19 CN disclosed
WO-2022221354-A1 PERSONAL CARE COMPOSITIONS COMPRISING SILAHYDROCARBONS MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2022-10-20 WO disclosed
US-9856349-B2 Catalysts and methods for polymer synthesis SAUDI ARAMCO TECHNOLOGIES COMPANY (SA) 2018-01-02 US disclosed
CN-1512196-A Optical element with anti reflective film ������������ʽ���� 2004-07-14 CN disclosed
EP-1433809-A1 Optical member having antireflection film HOYA CORPORATION (JP) 2004-06-30 EP disclosed
US-6649314-B1 Forming latent image; toner developing; charge erasing to remove residual surface charge; transferring image to receiver NEXPRESS SOLUTIONS LLC 2003-11-18 US disclosed
US-6436824-B1 Low dielectric constant materials for copper damascene CHARTERED SEMICONDUCTOR MANUFACTURING LTD. (SG) 2002-08-20 US disclosed
WO-2000050478-A1 NOVEL FORMULATIONS OF ALKYLLITHIUMS WITH IMPROVED THERMAL STABILITY, PROCESSES TO PRODUCE THESE FORMULATIONS AND PROCESSES FOR USING THE SAME TO IMPROVE STABILITY OF LIVING POLYMER CHAIN ENDS FMC CORPORATION (US) 2000-08-31 WO disclosed