Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.70 |
| ▸ | TSHR | P16473 | 6/20 | 0.70 |
| ▸ | TP53 | P04637 | 3/20 | 0.70 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.70 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.70 |
| ▸ | THRB | P10828 | 2/20 | 0.53 |
| ▸ | CA12 | O43570 | 1/20 | 0.49 |
| ▸ | CA1 | P00915 | 1/20 | 0.49 |
| ▸ | CA2 | P00918 | 1/20 | 0.49 |
| ▸ | CA9 | Q16790 | 1/20 | 0.49 |
| ▸ | HPGD | P15428 | 1/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.48 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.42 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.42 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.42 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.42 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.42 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.42 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL770900 | 1.00 | ALDH1A1 (0.70) | ALDH1A1TSHRTP53HIF1AHSD17B10 | |
| SCHEMBL30508441 | 0.89 | TSHR (0.55) | ALDH1A1TSHRTP53HIF1AHSD17B10 | |
| SCHEMBL6657526 | 0.89 | TSHR (0.55) | ALDH1A1TSHRTP53HIF1AHSD17B10 | |
| SCHEMBL26944275 | 0.89 | TSHR (0.70) | ALDH1A1TSHRTP53HIF1AHSD17B10 | |
| SCHEMBL15115 | 0.88 | TSHR (0.56) | ALDH1A1TSHRTP53HIF1AHSD17B10 | |
| Hydrochloric Acid SCHEMBL130714 | 0.86 | TSHR (0.54) | ALDH1A1TSHRTP53HIF1AHSD17B10 | |
| SCHEMBL28612529 | 0.86 | TSHR (0.54) | ALDH1A1TSHRTP53HIF1AHSD17B10 | |
| Iodide SCHEMBL1254059 | 0.86 | TSHR (0.54) | ALDH1A1TSHRTP53HIF1AHSD17B10 | |
| Ethylene SCHEMBL8397415 | 0.86 | TSHR (0.54) | ALDH1A1TSHRTP53HIF1AHSD17B10 | |
| Fluoride SCHEMBL1255037 | 0.86 | TSHR (0.54) | ALDH1A1TSHRTP53HIF1AHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2302007-B1 | Ink composition and inkjet recording method | FUJIFILM CORP (JP) | 2014-01-29 | — | — | EP | disclosed |
| US-8342674-B2 | Ink composition and inkjet recording method | FUJIFILM CORPORATION (JP) | 2013-01-01 | — | — | US | disclosed |
| US-8342674-B2 | Ink composition and inkjet recording method | FUJIFILM CORPORATION (JP) | 2013-01-01 | — | — | US | disclosed |
| US-8309669-B2 | Use of swellable polymer for sealing | EVONIK RÖHM GMBH (DE) | 2012-11-13 | — | — | US | disclosed |
| EP-2371910-A9 | Ink composition, inkjet recording method and process for producing molded printed material | Fujifilm Corporation (JP) | 2012-07-11 | — | — | EP | disclosed |
| US-20110242191-A1 | INK COMPOSITION, INKJET RECORDING METHOD AND PROCESS FOR PRODUCING MOLDED PRINTED MATERIAL | FUJIFILM CORPORATION (JP) | 2011-10-06 | — | — | US | disclosed |
| US-20110242191-A1 | INK COMPOSITION, INKJET RECORDING METHOD AND PROCESS FOR PRODUCING MOLDED PRINTED MATERIAL | FUJIFILM CORPORATION (JP) | 2011-10-06 | — | — | US | disclosed |
| EP-2371910-A1 | Ink composition, inkjet recording method and process for producing molded printed material | Fujifilm Corporation (JP) | 2011-10-05 | — | — | EP | disclosed |
| US-20110074897-A1 | INK COMPOSITION AND INKJET RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20110074897-A1 | INK COMPOSITION AND INKJET RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2011-03-31 | — | — | US | disclosed |
| EP-1046957-B1 | Photosensitive resin composition | JSR CORP (JP) | 2004-07-28 | — | — | EP | disclosed |
| US-6280905-B1 | LIGHT SENSITIVE ELEMENT WITH COPOLYMER OF ALAPHATIC CONJUGATED DIENE AND UNSATURATED AMINO COMPOUNDS | JSR CORPORATION (JP) | 2001-08-28 | — | — | US | disclosed |
| EP-1046957-A1 | Photosensitive resin composition | JSR Corporation (JP) | 2000-10-25 | — | — | EP | disclosed |
| EP-0440444-B1 | Photosensitive resin composition | NIPPON PAINT CO LTD (JP) | 1996-12-27 | — | — | EP | disclosed |
| EP-0438255-B1 | Process for preparing crosslinked resin particles | NIPPON PAINT CO LTD (JP) | 1995-11-15 | — | — | EP | disclosed |
| US-5422121-A | Oral dosage unit form | ROHM GMBH (DE) | 1995-06-06 | — | — | US | disclosed |
| US-5204221-A | Crosslinked vinyl polymer and unsaturated monomer; for flexographic printing, printed circuits; storage stability and water developability | NIPPON PAINT CO., LTD. (JP) | 1993-04-20 | — | — | US | disclosed |
| US-5198500-A | PROCESS FOR PREPARING CROSSLINKED RESIN PARTICLES | NIPPON PAINT CO., LTD. (JP) | 1993-03-30 | — | — | US | disclosed |
| EP-0440444-A2 | Photosensitive resin composition | NIPPON PAINT CO., LTD. (JP) | 1991-08-07 | — | — | EP | disclosed |
| EP-0438255-A2 | Process for preparing crosslinked resin particles | NIPPON PAINT CO., LTD. (JP) | 1991-07-24 | — | — | EP | disclosed |