⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6914262 | 0.95 | — | — | |
| SCHEMBL9775387 | 0.74 | — | — | |
| SCHEMBL4079132 | 0.70 | — | — | |
| SCHEMBL4082134 | 0.70 | — | — | |
| SCHEMBL3627555 | 0.67 | — | — | |
| SCHEMBL1042736 | 0.67 | — | — | |
| SCHEMBL85727 | 0.59 | — | — | |
| SCHEMBL3300416 | 0.59 | — | — | |
| SCHEMBL152107 | 0.59 | — | — | |
| Iodide SCHEMBL25276934 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 471 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260028315-A1 | IMPROVED PREPARATION METHOD FOR RUCAPARIB | KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION (KR) | 2026-01-29 | — | — | US | claimed |
| US-20250069948-A1 | DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS | LAM RESEARCH CORPORATION (US) | 2025-02-27 | — | — | US | claimed |
| EP-4448831-A1 | DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS | Lam Research Corporation (US) | 2024-10-23 | — | — | EP | claimed |
| CN-118434908-A | Metal deposition in recessed features using halogen-containing deposition inhibitors | 朗姆研究公司 | 2024-08-02 | — | — | CN | claimed |
| WO-2023167475-A1 | IMPROVED PREPARATION METHOD FOR RUCAPARIB | 고려대학교 산학협력단 | 2023-09-07 | — | — | WO | claimed |
| WO-2023114640-A1 | DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | claimed |
| CN-112473396-B | Anion exchange membrane material for diffusion dialysis acid recovery and preparation method thereof | 西安建筑科技大学 | 2022-06-24 | — | — | CN | claimed |
| CN-114478346-A | Method for preparing Upacatinib intermediate | 和鼎（南京）医药技术有限公司 | 2022-05-13 | — | — | CN | claimed |
| CN-112473396-A | Anion exchange membrane material for diffusion dialysis acid recovery and preparation method thereof | 西安建筑科技大学 | 2021-03-12 | — | — | CN | claimed |
| CN-108101066-B | Preparation method and application of hydrophobic spherical ordered hierarchical porous silicon dioxide adsorbent | 浙江大学 | 2020-05-29 | — | — | CN | claimed |
| CN-108101066-A | A kind of preparation method and applications of the spherical ordered multi-stage porous silica adsorbent of hydrophobicity | 浙江大学 | 2018-06-01 | — | — | CN | claimed |
| EP-0882755-B1 | Radially layered copoly (amidoamineorganosilicon) dendrimers | MICHIGAN MOLECULAR INST (US) | 2002-08-14 | — | — | EP | claimed |
| EP-0882755-A1 | Radially layered copoly (amidoamineorganosilicon) dendrimers | DOW CORNING CORPORATION (US) | 1998-12-09 | — | — | EP | claimed |
| US-5739218-A | HYDROPHOBIC; WATER INSOLUBILITY; MONOLAYERS ON WATER SUSTAIN SURFACE PRESSURE | DOW CORNING CORPORATION (US) | 1998-04-14 | — | — | US | claimed |
| US-5684195-A | SULFINIC ACID SALT INTERMEDIATE, OXIDATIVE AMINATION | G. D. SEARLE & CO. (US) | 1997-11-04 | — | — | US | claimed |
| EP-0070198-B1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMATION METHOD USING THE SAME | Hitachi, Ltd. (JP) | 1985-06-19 | — | — | EP | claimed |
| EP-0070198-A1 | Radiation-sensitive composition and pattern-formation method using the same | Hitachi, Ltd. (JP) | 1983-01-19 | — | — | EP | claimed |
| US-20260136848-A1 | DEPOSITION OF METAL-CONTAINING FILMS | LAM RES CORP (US) | 2026-05-14 | — | — | US | disclosed |
| EP-0070198-A1 | Radiation-sensitive composition and pattern-formation method using the same | Hitachi, Ltd. (JP) | 1983-01-19 | — | — | EP | disclosed |
| US-4139403-A | Dinitroalkyl and fluorodinitroalkyl silicon compounds | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) | 1979-02-13 | — | — | US | disclosed |