Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 9/20 | 0.39 |
| ▸ | TP53 | P04637 | 2/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | THRB | P10828 | 3/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 2/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28324316 | 0.86 | TSHR (0.47) | ALDH1A1NPSR1TSHRHSD17B10THRB | |
| Acrylic Acid Methyl Ester SCHEMBL27997224 | 0.80 | TSHR (0.51) | ALDH1A1NPSR1TSHRTP53HIF1A | |
| Methacrylic Acid SCHEMBL28815698 | 0.80 | THRB (0.49) | ALDH1A1NPSR1TSHRTHRBL3MBTL1 | |
| Acrylic Acid Methyl Ester SCHEMBL28310777 | 0.78 | TSHR (0.50) | ALDH1A1TSHRTP53HIF1AHSD17B10 | |
| Acrylic Acid Methyl Ester SCHEMBL28218691 | 0.73 | TSHR (0.45) | ALDH1A1TSHRTP53HIF1AHSD17B10 | |
| Acrylic Acid Methyl Ester SCHEMBL27647021 | 0.72 | THRB (0.72) | ALDH1A1TSHRTP53HIF1AHSD17B10 | |
| SCHEMBL26250 | 0.71 | TSHR (0.75) | ALDH1A1TSHRTP53HIF1AHSD17B10 | |
| Acrylic Acid Methyl Ester SCHEMBL235879 | 0.71 | TSHR (0.44) | ALDH1A1TSHRTP53HIF1AHSD17B10 | |
| SCHEMBL28839132 | 0.71 | TSHR (0.41) | ALDH1A1NPSR1TSHRTHRBATM | |
| Acrylic Acid Methyl Ester SCHEMBL28105774 | 0.71 | THRB (0.51) | ALDH1A1NPSR1TSHRTP53HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106414635-B | The method for temporary fixing of adhesive composite and the component using adhesive composite | 电化株式会社 | 2019-09-17 | — | — | CN | disclosed |
| CN-109923190-A | Dryingagent | 大金工业株式会社 | 2019-06-21 | — | — | CN | disclosed |
| CN-103360791-B | Colorant dispersion | 住友化学株式会社 | 2019-06-07 | — | — | CN | disclosed |
| CN-109071991-A | COATING FILM, COMPOSITION FOR COATING FILM, FILM-FORMING AGENT, ARTICLE HAVING COATING FILM, AND METHOD FOR FORMING COATING FILM | 大金工业株式会社 | 2018-12-21 | — | — | CN | disclosed |
| CN-108873137-A | The polarizer and its manufacturing method | 住友化学株式会社 | 2018-11-23 | — | — | CN | disclosed |
| CN-108699426-A | Surface treating agent | 大金工业株式会社 | 2018-10-23 | — | — | CN | disclosed |
| CN-108350117-A | Siloxanyl monomers and its polymer, the composition containing the polymer, electronic component | DIC株式会社 | 2018-07-31 | — | — | CN | disclosed |
| CN-102879848-B | Polarizer and method for manufacturing same | 住友化学株式会社 | 2018-07-13 | — | — | CN | disclosed |
| CN-104345557-B | Negative photosensitive resin composition, pattern, crystal grain and device manufacturing method | 奇美实业股份有限公司 | 2018-06-22 | — | — | CN | disclosed |
| CN-108027556-A | Photosensitive polymer combination, photosensitive element, the manufacture method of the forming method of Resist patterns and touch panel | 日立化成株式会社 | 2018-05-11 | — | — | CN | disclosed |
| CN-104140775-B | Transparent pressure-sensitive adhesive sheet composition | 昭和电工株式会社 | 2017-09-15 | — | — | CN | disclosed |
| CN-106414635-A | Adhesive agent composition, and temporary member-fixation method using same | 电化株式会社 | 2017-02-15 | — | — | CN | disclosed |
| CN-104678706-A | COLORED CURABLE RESIN COMPOSITION | SUMITOMO CHEMICAL CO | 2015-06-03 | — | — | CN | disclosed |
| CN-104345557-A | Negative photosensitive resin composition, pattern, crystal grain and device manufacturing method | CHI MEI CORP | 2015-02-11 | — | — | CN | disclosed |