SCHEMBL28007308

SCHEMBL28007308

CCCC(=O)C1(O)CCCCC1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.41
CES2 O00748 1/20 0.36
CES1 P23141 1/20 0.36
HDAC3 O15379 4/20 0.35
HDAC1 Q13547 4/20 0.35
HDAC2 Q92769 4/20 0.35
HDAC8 Q9BY41 4/20 0.35
FFAR3 O14843 3/20 0.35
TSHR P16473 1/20 0.33
ALDH1A1 P00352 1/20 0.32
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
CYP2C19 P33261 1/20 0.31
HDAC6 Q9UBN7 1/20 0.31
PTPN1 P18031 1/20 0.31
ACP1 P24666 1/20 0.31
CDC25B P30305 1/20 0.31
CTSD P07339 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2789435 0.85 TDP1 (0.44) CES2CES1TSHRALDH1A1MEN1
SCHEMBL29242032 0.84 CES1 (0.42) CES2CES1TSHRALDH1A1MEN1
SCHEMBL6903844 0.84 CES2 (0.45) CES2CES1TSHRALDH1A1MEN1
SCHEMBL13545190 0.81 FFAR3 (0.36) LMNAFFAR3TSHRALDH1A1TDP1
SCHEMBL28268649 0.81 FFAR3 (0.36) LMNAFFAR3TSHRALDH1A1TDP1
SCHEMBL28956420 0.79 CYP2C19 (0.32) LMNATSHRALDH1A1CYP2C19
SCHEMBL13545128 0.78 TDP1 (0.32) FFAR3ALDH1A1TDP1CYP2C19
Butyric Acid SCHEMBL11144951 0.75 FFAR3 (0.50) LMNAHDAC3HDAC1HDAC2HDAC8
SCHEMBL28460716 0.74 CETP (0.36) L3MBTL1PTPN1
SCHEMBL15125228 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104641293-B Photosensitive resin composition 旭化成株式会社 2019-04-19 CN disclosed
CN-109298601-A Photosensitive polymer combination 旭化成株式会社 2019-02-01 CN disclosed
CN-104641293-A Photosensitive resin composition ASAHI KASEI E MATERIALS CORP 2015-05-20 CN disclosed