SCHEMBL2802029

SCHEMBL2802029

FC(=S)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11884046 0.76
SCHEMBL24107397 0.70
SCHEMBL1681777 0.70
SCHEMBL2279469 0.70
SCHEMBL5438 0.67
SCHEMBL15114437 0.67
SCHEMBL10660232 0.67
SCHEMBL1431301 0.67
SCHEMBL3942553 0.67
Water SCHEMBL27724997 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100320428-A1 GASEOUS DIELECTRICS WITH LOW GLOBAL WARMING POTENTIALS HONEYWELL INTERNATIONAL INC. (US) 2010-12-23 US claimed
EP-2097909-A2 GASEOUS DIELECTRICS WITH LOW GLOBAL WARMING POTENTIALS Honeywell International Inc. (US) 2009-09-09 EP claimed
WO-2008073790-A2 GASEOUS DIELECTRICS WITH LOW GLOBAL WARMING POTENTIALS HONEYWELL INTERNATIONAL INC. (US) 2008-06-19 WO claimed
US-20080135817-A1 Gaseous dielectrics with low global warming potentials HONEYWELL INTERNATIONAL INC. 2008-06-12 US claimed
CN-109796981-B Etching gas mixture, pattern forming method and integrated circuit device manufacturing method 三星电子株式会社 2022-11-22 CN disclosed
US-20100320428-A1 GASEOUS DIELECTRICS WITH LOW GLOBAL WARMING POTENTIALS HONEYWELL INTERNATIONAL INC. (US) 2010-12-23 US disclosed
US-7807074-B2 Gaseous dielectrics with low global warming potentials HONEYWELL INTERNATIONAL INC. (US) 2010-10-05 US disclosed
US-20080135817-A1 Gaseous dielectrics with low global warming potentials HONEYWELL INTERNATIONAL INC. 2008-06-12 US disclosed
US-5349076-A Method bis(trifluoromethylthio)arsine THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY (US) 1994-09-20 US disclosed