SCHEMBL2279469

SCHEMBL2279469

FC(F)(F)C(=S)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL27724997 0.95
Water SCHEMBL27745803 0.95
SCHEMBL24107593 0.76
SCHEMBL11856495 0.71 PKM (0.30)
SCHEMBL1681777 0.70
SCHEMBL2802029 0.70
SCHEMBL10660232 0.67
SCHEMBL15114437 0.67
SCHEMBL3942553 0.67
SCHEMBL1431301 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 79 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12183591-B2 Etching gas compositions, methods of forming micropatterns, and methods of manufacturing semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2024-12-31 US claimed
CN-117088796-A Method for synthesizing beta-trifluoromethylthioketone derivative by ring opening of cyclopropyl alcohol derivative 天津师范大学 2023-11-21 CN claimed
US-20220310407-A1 ETCHING GAS COMPOSITIONS, METHODS OF FORMING MICROPATTERNS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE Wonik Materials (KR) 2022-09-29 US claimed
EP-1377876-A4 HIGH RESOLUTION RESISTS FOR NEXT GENERATION LITHOGRAPHIES GONSALVES KENNETH E (US) 2007-05-23 EP claimed
US-7008749-B2 High resolution resists for next generation lithographies THE UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE (US) 2006-03-07 US claimed
EP-1377876-A1 HIGH RESOLUTION RESISTS FOR NEXT GENERATION LITHOGRAPHIES Gonsalves, Kenneth E. (US) 2004-01-07 EP claimed
US-20020182541-A1 High resolution resists for next generation lithographies NATIONAL SCIENCE FOUNDATION 2002-12-05 US claimed
WO-2002073308-A1 HIGH RESOLUTION RESISTS FOR NEXT GENERATION LITHOGRAPHIES UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE (US) 2002-09-19 WO claimed
US-4367349-A HEXAFLUOROTHIOACETONE DIMER AND FORMALDEHYDE ALLIED CORPORATION (US) 1983-01-04 US claimed
US-4326068-A Process of preparing hexafluorothioacetone dimer ALLIED CORPORATION (US) 1982-04-20 US claimed
US-4252719-A REMOVAL OF A TERTIARY HYDROGEN FROM A 5-A-STEROID BY CHLORINATING THE STEROID BEING FIRST ESTERIFIED BY AN IODOARYL-CONTAINING ESTERIFICATION AGENT RESEARCH CORPORATION (US) 1981-02-24 US claimed
US-4244891-A BY REACTION OF KETENE WITH HEXAFLUOROTHIOACETONE ALLIED CHEMICAL CORPORATION (US) 1981-01-13 US claimed
JP-62204827-A None JP disclosed
US-12183591-B2 Etching gas compositions, methods of forming micropatterns, and methods of manufacturing semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2024-12-31 US disclosed
US-20240234031-A1 SEMICONDUCTOR DEVICE AND SEMICONDUCTOR APPARATUS AND ELECTRONIC APPARATUS INCLUDING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2024-07-11 US disclosed
US-11814561-B2 Dry etching gas composition comprising sulfur-containing fluorocarbon compound having unsaturated bond and dry etching method using the same KANTO DENKA KOGYO CO., LTD. (JP) 2023-11-14 US disclosed
US-4244891-A BY REACTION OF KETENE WITH HEXAFLUOROTHIOACETONE ALLIED CHEMICAL CORPORATION (US) 1981-01-13 US disclosed
US-3976769-A INSECTICIDE AIRWICK INDUSTRIES, INC. (US) 1976-08-24 US disclosed
US-3937738-A CHEMICAL INTERMEDIATES, SOLVENTS, PESTICIDES MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1976-02-10 US disclosed
US-3932508-A Polyfluoromethylthio-substituted compounds MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1976-01-13 US disclosed