⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27973088 | 1.00 | — | — | |
| SCHEMBL8619869 | 0.94 | — | — | |
| SCHEMBL22634 | 0.94 | — | — | |
| Methane SCHEMBL525613 | 0.89 | — | — | |
| SCHEMBL5961103 | 0.89 | — | — | |
| Hydrochloric Acid SCHEMBL23581440 | 0.89 | — | — | |
| Hydrochloric Acid SCHEMBL7630001 | 0.89 | — | — | |
| Bromide SCHEMBL10572728 | 0.89 | — | — | |
| SCHEMBL28105127 | 0.89 | — | — | |
| Ethylene SCHEMBL11423042 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8440775-B2 | Curable liquid composition, method of coating, inorganic substrate, and semiconductor device | DOW CORNING CORPORATION (US) | 2013-05-14 | — | — | US | claimed |
| US-20100089451-A1 | Curable Liquid Composition, Method Of Coating, Inorganic Substrate, and Semiconductor Device | DOW CORNING TORAY COMPANY, LTD. (JP) | 2010-04-15 | — | — | US | claimed |
| EP-2118175-A2 | CURABLE LIQUID COMPOSITION, METHOD OF COATING, INORGANIC SUBSTRATE, AND SEMICONDUCTOR DEVICE | Dow Corning Toray Co., Ltd. (JP) | 2009-11-18 | — | — | EP | claimed |
| WO-2008099767-A2 | CURABLE LIQUID COMPOSITION, METHOD OF COATING, INORGANIC SUBSTRATE, AND SEMICONDUCTOR DEVICE | DOW CORNING TORAY CO., LTD. (JP) | 2008-08-21 | — | — | WO | claimed |
| US-8440775-B2 | Curable liquid composition, method of coating, inorganic substrate, and semiconductor device | DOW CORNING CORPORATION (US) | 2013-05-14 | — | — | US | disclosed |
| US-20100089451-A1 | Curable Liquid Composition, Method Of Coating, Inorganic Substrate, and Semiconductor Device | DOW CORNING TORAY COMPANY, LTD. (JP) | 2010-04-15 | — | — | US | disclosed |
| EP-2118175-A2 | CURABLE LIQUID COMPOSITION, METHOD OF COATING, INORGANIC SUBSTRATE, AND SEMICONDUCTOR DEVICE | Dow Corning Toray Co., Ltd. (JP) | 2009-11-18 | — | — | EP | disclosed |
| WO-2008099767-A2 | CURABLE LIQUID COMPOSITION, METHOD OF COATING, INORGANIC SUBSTRATE, AND SEMICONDUCTOR DEVICE | DOW CORNING TORAY CO., LTD. (JP) | 2008-08-21 | — | — | WO | disclosed |