Methane

Methane

SCHEMBL525613

C.CO[SiH2]OC

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8619869 0.94
SCHEMBL22634 0.94
Methylamine SCHEMBL28678658 0.91
SCHEMBL5961103 0.89
SCHEMBL2802260 0.89
Hydrochloric Acid SCHEMBL23581440 0.89
Hydrochloric Acid SCHEMBL7630001 0.89
Bromide SCHEMBL10572728 0.89
Ethane SCHEMBL28549872 0.89
SCHEMBL28105127 0.89

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 134 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2279226-B1 SURFACE MODIFIED SILICON DIOXIDE PARTICLES EVONIK DEGUSSA GMBH (DE) 2017-08-09 EP claimed
EP-2569362-A1 INSULATION FOR ROTATING ELECTRICAL MACHINES Siemens Aktiengesellschaft (DE) 2013-03-20 EP claimed
WO-2012013439-A1 INSULATION FOR ROTATING ELECTRICAL MACHINES SIEMENS AKTIENGESELLSCHAFT (DE) 2012-02-02 WO claimed
EP-2279226-A1 SURFACE MODIFIED SILICON DIOXIDE PARTICLES Nanoresins AG (DE) 2011-02-02 EP claimed
WO-2009127438-A1 SURFACE MODIFIED SILICON DIOXIDE PARTICLES NANORESINS AG 2009-10-22 WO claimed
EP-1355952-A4 METHOD FOR PRODUCING A CATALYST FOR HOMO- OR CO- POLYMERIZATION OF ETHYLENE SAMSUNG GENERAL CHEMICALS CO (KR) 2005-01-12 EP claimed
EP-1355952-A1 METHOD FOR PRODUCING A CATALYST FOR HOMO- OR CO- POLYMERIZATION OF ETHYLENE Samsung General Chemicals Co., Ltd. (KR) 2003-10-29 EP claimed
WO-2002038619-A1 METHOD FOR PRODUCING A CATALYST FOR HOMO- OR CO- POLYMERIZATION OF ETHYLENE SAMSUNG GENERAL CHEMICALS CO., LTD. (KR) 2002-05-16 WO claimed
EP-0548996-B1 A film capacitor and method for manufacturing the same MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 1998-08-26 EP claimed
US-5331504-A Film capacitor and method for manufacturing the same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1994-07-19 US claimed
EP-0548996-A2 A film capacitor and method for manufacturing the same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1993-06-30 EP claimed
WO-2024024613-A1 COATED ARTICLE AND PRODUCTION METHOD THEREFOR 信越化学工業株式会社 2024-02-01 WO disclosed
WO-2024024615-A1 PRIMER COMPOSITION AND COATED ARTICLE 信越化学工業株式会社 2024-02-01 WO disclosed
US-20230183513-A1 METAL PLATE COATING MATERIAL AND COATED METAL PLATE PRODUCTION METHOD USING SAME NIPPON STEEL COATED SHEET CORPORATION (JP) 2023-06-15 US disclosed
EP-4104939-A1 METAL PLATE COATING MATERIAL AND COATED METAL PLATE PRODUCTION METHOD USING SAME NIPPON STEEL CORPORATION (JP) 2022-12-21 EP disclosed
EP-0548996-B1 A film capacitor and method for manufacturing the same MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 1998-08-26 EP disclosed
EP-0519181-B1 Preparation of 3-chloropropylsilanes HUELS CHEMISCHE WERKE AG (DE) 1996-01-31 EP disclosed
US-5331504-A Film capacitor and method for manufacturing the same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1994-07-19 US disclosed
EP-0548996-A2 A film capacitor and method for manufacturing the same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1993-06-30 EP disclosed
EP-0519181-A1 Preparation of 3-chloropropylsilanes HÜLS AKTIENGESELLSCHAFT (DE) 1992-12-23 EP disclosed