SCHEMBL2802784

SCHEMBL2802784

C=CC(=O)OOCCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL703765 0.87 TSHR (0.52)
SCHEMBL27685045 0.86 TSHR (0.50)
Ethylene Glycol SCHEMBL8761467 0.83 TSHR (0.63)
SCHEMBL7649953 0.81
SCHEMBL5818126 0.81
SCHEMBL5493232 0.80
SCHEMBL8346320 0.80 TSHR (0.41)
Di(Hydroxyethyl)Ether SCHEMBL56947 0.80 TSHR (0.48)
SCHEMBL5489831 0.79
SCHEMBL8442648 0.79 TSHR (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116970207-A Hydrophilic poly (meth) acrylate copolymer film for biological test strip, preparation method and application thereof 台湾科思创股份有限公司 2023-10-31 CN disclosed
CN-112512988-B Radiation curable compositions for coating optical fibers 科思创(荷兰)有限公司(NL) 2023-01-13 CN disclosed
CN-115494698-A Method for manufacturing semiconductor device and photoresist 台湾积体电路制造股份有限公司 2022-12-20 CN disclosed
CN-113248955-B Ultraviolet-curable coating composition 株式会社KCC 2022-08-09 CN disclosed
EP-3166797-B1 RADIATION-CURABLE INKJET INKS AND COATINGS SUN CHEMICAL CORP (US) 2022-04-06 EP disclosed
CN-111825874-B Polymer electrolyte prepared based on surface initiation, preparation and application thereof 华中科技大学 2021-08-10 CN disclosed
CN-112512988-A Radiation curable compositions for coating optical fibers 帝斯曼知识产权资产管理有限公司 2021-03-16 CN disclosed
CN-106574142-B Monochromatic actinic radiation curable coatings for optical fibers 帝斯曼知识产权资产管理有限公司 2020-12-11 CN disclosed
CN-111826242-A Cleaning solution, method of cleaning semiconductor substrate, and method of manufacturing semiconductor device 台湾积体电路制造股份有限公司 2020-10-27 CN disclosed
CN-111825874-A Polymer electrolyte prepared based on surface initiation, preparation and application thereof 华中科技大学 2020-10-27 CN disclosed
US-20170204282-A1 RADIATION-CURABLE INKJET INKS AND COATINGS SUN CHEMICAL CORPORATION (US) 2017-07-20 US disclosed
EP-3166797-A1 RADIATION-CURABLE INKJET INKS AND COATINGS Sun Chemical Corporation (US) 2017-05-17 EP disclosed
WO-2016007593-A1 RADIATION-CURABLE INKJET INKS AND COATINGS SUN CHEMICAL CORPORATION (US) 2016-01-14 WO disclosed
US-20100103699-A1 METHOD FOR MANUFACTURING LIGHT GUIDE PANEL, LIGHT GUIDE PANEL AND LIGHT SOURCE UNIT KURODA ELECTRIC CO., LTD. (JP) 2010-04-29 US disclosed
EP-2180360-A2 Light guide panel, method for manufacuring the same and light source unit Kuroda Electric Co., Ltd. (JP) 2010-04-28 EP disclosed
US-20070072124-A1 Optical recording composition, production method thereof and optical recording medium FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed
US-6495067-B1 SUBSTANTIALLY NONVOLATILE ELECTROLYTE, EXCELLENT IN CHARGE TRANSPORTING PERFORMANCE, PROVIDING PHOTOELECTROCHEMICAL CELL WITH EXCELLENT PHOTOELECTRIC CONVERSION CHARACTERISTICS WHICH UNDERGOES LITTLE DETERIORATION IN PERFORMANCE WITH TIME FUJI PHOTO FILM CO., LTD. (JP) 2002-12-17 US disclosed