Ethane

Ethane

SCHEMBL28032432

C=C(C)C(=O)NC(C)O.CC

nearest known ligand 0.47

Full drug profile on Sugi Atlas →

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TGFBR1 P36897 1/20 0.47
RXFP1 Q9HBX9 1/20 0.38
ALDH1A1 P00352 2/20 0.35
TDP1 Q9NUW8 1/20 0.33
KDM4E B2RXH2 1/20 0.32
TSHR P16473 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL50197 0.97
Isopropyl Alcohol SCHEMBL2342152 0.80 TGFBR1 (0.47) TGFBR1RXFP1ALDH1A1TDP1KDM4E
SCHEMBL14951 0.79
SCHEMBL1820299 0.79 TGFBR1 (0.50) TGFBR1RXFP1ALDH1A1TDP1KDM4E
SCHEMBL2487819 0.79 TGFBR1 (0.50) TGFBR1RXFP1ALDH1A1TDP1KDM4E
SCHEMBL24333197 0.79 TGFBR1 (0.50) TGFBR1RXFP1ALDH1A1TDP1KDM4E
SCHEMBL27401861 0.79
SCHEMBL11342032 0.78 TGFBR1 (0.45) TGFBR1RXFP1ALDH1A1TDP1KDM4E
SCHEMBL1263729 0.78 TGFBR1 (0.45) TGFBR1RXFP1ALDH1A1TDP1KDM4E
SCHEMBL5056247 0.78 TGFBR1 (0.45) TGFBR1RXFP1ALDH1A1TDP1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106233424-B Silicon Wafer composition for polishing 福吉米株式会社 2018-12-25 CN disclosed
CN-106233424-A Silicon Wafer composition for polishing 福吉米株式会社 2016-12-14 CN disclosed
CN-106233423-A composition for polishing silicon wafer 福吉米株式会社 2016-12-14 CN disclosed
CN-105073941-A Polishing composition and method for manufacturing polished article FUJIMI INC 2015-11-18 CN disclosed
CN-104995277-A POLISHING COMPOSITION, PRODUCTION METHOD FOR POLISHING COMPOSITION, AND PRODUCTION METHOD FOR POLISHED ARTICLE FUJIMI INC 2015-10-21 CN disclosed