Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.65 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | ACACB | O00763 | 2/20 | 0.34 |
| ▸ | TGM2 | P21980 | 3/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.33 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL50319 | 0.97 | — | — | |
| SCHEMBL13289234 | 0.97 | — | — | |
| SCHEMBL26479936 | 0.79 | TSHR (0.71) | TSHRALDH1A1MAPK1TDP1CYP2C19 | |
| SCHEMBL27799665 | 0.79 | TSHR (1.00) | TSHRALDH1A1MAPK1TDP1CYP2C19 | |
| SCHEMBL636063 | 0.79 | TSHR (0.71) | TSHRALDH1A1MAPK1TDP1CYP2C19 | |
| SCHEMBL15072 | 0.79 | — | — | |
| SCHEMBL28341390 | 0.78 | TSHR (0.62) | TSHRALDH1A1MAPK1TDP1CYP2C19 | |
| SCHEMBL3888297 | 0.78 | TSHR (0.62) | TSHRALDH1A1MAPK1TDP1CYP2C19 | |
| SCHEMBL8052512 | 0.78 | TSHR (0.62) | TSHRALDH1A1MAPK1TDP1CYP2C19 | |
| Water SCHEMBL23706522 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106233424-B | Silicon Wafer composition for polishing | 福吉米株式会社 | 2018-12-25 | — | — | CN | disclosed |
| CN-106463386-A | Method for polishing silicon wafer, polishing composition, and polishing composition set | 福吉米株式会社 | 2017-02-22 | — | — | CN | disclosed |
| CN-106233424-A | Silicon Wafer composition for polishing | 福吉米株式会社 | 2016-12-14 | — | — | CN | disclosed |
| CN-106233423-A | composition for polishing silicon wafer | 福吉米株式会社 | 2016-12-14 | — | — | CN | disclosed |
| CN-105073941-A | Polishing composition and method for manufacturing polished article | FUJIMI INC | 2015-11-18 | — | — | CN | disclosed |
| CN-104995277-A | POLISHING COMPOSITION, PRODUCTION METHOD FOR POLISHING COMPOSITION, AND PRODUCTION METHOD FOR POLISHED ARTICLE | FUJIMI INC | 2015-10-21 | — | — | CN | disclosed |