⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18062494 | 0.76 | TSHR (0.39) | — | |
| SCHEMBL49846 | 0.72 | — | — | |
| SCHEMBL4508258 | 0.72 | — | — | |
| SCHEMBL5395305 | 0.72 | — | — | |
| SCHEMBL18992116 | 0.71 | — | — | |
| SCHEMBL27966980 | 0.71 | — | — | |
| SCHEMBL17711118 | 0.69 | ALDH1A1 (0.31) | — | |
| Hydrochloric Acid SCHEMBL29078969 | 0.69 | — | — | |
| Iodide SCHEMBL15796909 | 0.69 | — | — | |
| SCHEMBL17821882 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108474114-A | Method for depositing conformal metal or metalloid silicon nitride films | 弗萨姆材料美国有限责任公司 | 2018-08-31 | — | — | CN | claimed |
| CN-108026637-A | Method for depositing conformal metal or metalloid silicon nitride films and resulting films | 弗萨姆材料美国有限责任公司 | 2018-05-11 | — | — | CN | claimed |
| CN-104962877-A | Compositions and methods for depositing silicon oxide films | AIR PROD & CHEM | 2015-10-07 | — | — | CN | claimed |
| CN-108026637-A | Method for depositing conformal metal or metalloid silicon nitride films and resulting films | 弗萨姆材料美国有限责任公司 | 2018-05-11 | — | — | CN | disclosed |
| CN-107660209-A | Boron-containing compounds, compositions and methods for depositing boron-containing films | 弗萨姆材料美国有限责任公司 | 2018-02-02 | — | — | CN | disclosed |
| CN-104962877-A | Compositions and methods for depositing silicon oxide films | AIR PROD & CHEM | 2015-10-07 | — | — | CN | disclosed |