Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL16242784 | 1.00 | — | — | |
| Acetic Acid SCHEMBL983718 | 0.87 | — | — | |
| Acetic Acid SCHEMBL6521750 | 0.80 | — | — | |
| Acetic Acid SCHEMBL1715210 | 0.80 | — | — | |
| Acetonitrile SCHEMBL166141 | 0.72 | — | — | |
| Acetic Acid SCHEMBL1714983 | 0.71 | — | — | |
| Acetic Acid SCHEMBL3783936 | 0.69 | FFAR3 (0.30) | — | |
| Acetic Acid SCHEMBL30750786 | 0.69 | CA1 (0.42) | — | |
| Acetic Acid SCHEMBL6353845 | 0.69 | — | — | |
| Acetic Acid SCHEMBL5837132 | 0.66 | CA1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2196850-B1 | CURED FILM OBTAINED USING A POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | SUMITOMO BAKELITE CO (JP) | 2014-10-08 | — | — | EP | disclosed |
| US-8309280-B2 | Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device | SUMITOMO BAKELITE CO., LTD. (JP) | 2012-11-13 | — | — | US | disclosed |
| US-20100239977-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PROTECTIVE FILM, INSULATING FILM, AND SEMICONDUCTOR DEVICE | SUMITOMO BAKELITE CO., LTD. (JP) | 2010-09-23 | — | — | US | disclosed |
| EP-2196850-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PROTECTIVE FILM, INSULATING FILM AND SEMICONDUCTOR DEVICE | Sumitomo Bakelite Co., Ltd. (JP) | 2010-06-16 | — | — | EP | disclosed |