⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5479316 | 0.75 | — | — | |
| SCHEMBL1945972 | 0.75 | TSHR (0.33) | — | |
| SCHEMBL2464434 | 0.70 | — | — | |
| SCHEMBL14331176 | 0.67 | — | — | |
| SCHEMBL3822523 | 0.67 | — | — | |
| SCHEMBL9770213 | 0.66 | — | — | |
| SCHEMBL465096 | 0.64 | — | — | |
| SCHEMBL17729851 | 0.61 | — | — | |
| SCHEMBL7561377 | 0.61 | — | — | |
| SCHEMBL2805763 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100320428-A1 | GASEOUS DIELECTRICS WITH LOW GLOBAL WARMING POTENTIALS | HONEYWELL INTERNATIONAL INC. (US) | 2010-12-23 | — | — | US | claimed |
| US-20080135817-A1 | Gaseous dielectrics with low global warming potentials | HONEYWELL INTERNATIONAL INC. | 2008-06-12 | — | — | US | claimed |
| US-20070224829-A1 | Use Of Hypofluorites, Fluoroperoxides, And/Or Fluorotrioxides As Oxidizing Agent In Fluorocarbon Etch Plasmas | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-09-27 | — | — | US | claimed |
| CN-1599038-A | Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmas | AIR PROD & CHEM (US) | 2005-03-23 | — | — | CN | claimed |
| US-20050014383-A1 | Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmas | VERSUM MATERIALS US, LLC | 2005-01-20 | — | — | US | claimed |
| EP-1498940-A2 | Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmas | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-01-19 | — | — | EP | claimed |
| US-20130000764-A1 | MULTI-LAYER MICRO/NANOFLUID DEVICES WITH BIO-NANOVALVES | UCHICAGO ARGONNE, LLC (US) | 2013-01-03 | — | — | US | disclosed |
| US-8343425-B1 | Multi-layer micro/nanofluid devices with bio-nanovalves | UCHICAGO ARGONNE, LLC (US) | 2013-01-01 | — | — | US | disclosed |
| US-20100320428-A1 | GASEOUS DIELECTRICS WITH LOW GLOBAL WARMING POTENTIALS | HONEYWELL INTERNATIONAL INC. (US) | 2010-12-23 | — | — | US | disclosed |
| US-7807074-B2 | Gaseous dielectrics with low global warming potentials | HONEYWELL INTERNATIONAL INC. (US) | 2010-10-05 | — | — | US | disclosed |
| US-20080135817-A1 | Gaseous dielectrics with low global warming potentials | HONEYWELL INTERNATIONAL INC. | 2008-06-12 | — | — | US | disclosed |
| US-20070224829-A1 | Use Of Hypofluorites, Fluoroperoxides, And/Or Fluorotrioxides As Oxidizing Agent In Fluorocarbon Etch Plasmas | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-09-27 | — | — | US | disclosed |
| CN-1599038-A | Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmas | AIR PROD & CHEM (US) | 2005-03-23 | — | — | CN | disclosed |
| US-20050014383-A1 | Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmas | VERSUM MATERIALS US, LLC | 2005-01-20 | — | — | US | disclosed |
| EP-1498940-A2 | Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmas | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-01-19 | — | — | EP | disclosed |