Tert-Butyl Formate

Tert-Butyl Formate

SCHEMBL28048389

CC(C)(C)OC=O.CCc1ncc[nH]1

nearest known ligand 0.46

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Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 11/20 0.46
HTR1A P08908 1/20 0.46
TDP1 Q9NUW8 1/20 0.42
FDPS P14324 1/20 0.41
ALOX15 P16050 1/20 0.35
TBXAS1 P24557 2/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP19A1 P11511 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
TERT O14746 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Formic Acid SCHEMBL28436057 0.79 TAAR1 (0.50) TAAR1HTR1AFDPSALOX15TBXAS1
SCHEMBL131702 0.78
Ammonia Solution, Strong SCHEMBL30638598 0.76
SCHEMBL30859449 0.76
SCHEMBL28550216 0.76
Iodide SCHEMBL633203 0.76
Water SCHEMBL7137776 0.76 TAAR1 (0.53) TAAR1HTR1AFDPSALOX15TBXAS1
Iodide SCHEMBL28564958 0.76
SCHEMBL4397237 0.76
Ammonia Solution, Strong SCHEMBL30638599 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106632921-B Block copolymer and pattern treatment compositions and method 罗门哈斯电子材料有限责任公司 2019-08-20 CN disclosed
CN-106243514-B Composition and method for pattern processing 罗门哈斯电子材料有限责任公司 2019-02-15 CN disclosed
CN-106243514-A The compositions processed for pattern and method 罗门哈斯电子材料有限责任公司 2016-12-21 CN disclosed
CN-106249540-A Pattern treatment method 陶氏环球技术有限责任公司 2016-12-21 CN disclosed
CN-106249539-A Pattern treatment method 罗门哈斯电子材料有限责任公司 2016-12-21 CN disclosed
CN-106243513-A The compositions processed for pattern and method 陶氏环球技术有限责任公司 2016-12-21 CN disclosed
CN-106154748-A Photoresist finish compositions and the method for processing photo-corrosion-resisting agent composition 罗门哈斯电子材料有限责任公司 2016-11-23 CN disclosed
CN-106094431-A Photo-corrosion-resisting agent composition and method 罗门哈斯电子材料韩国有限公司 2016-11-09 CN disclosed
CN-105739237-A PHOTOLITHOGRAPHIC METHODS 罗门哈斯电子材料有限责任公司 2016-07-06 CN disclosed
CN-105573063-A Pattern formation methods ROHM & HAAS ELECT MAT 2016-05-11 CN disclosed
CN-105573058-A Photoresist overcoat compositions ROHM & HAAS ELECT MAT 2016-05-11 CN disclosed
CN-105388709-A Multiple-pattern forming methods ROHM & HAAS ELECT MAT 2016-03-09 CN disclosed
CN-105319844-A Pattern shrink method DOW GLOBAL TECHNOLOGIES LLC 2016-02-10 CN disclosed