SCHEMBL28048455

SCHEMBL28048455

CC(=O)CC(=O)C(C)(C)C.[AlH3]

nearest known ligand 0.39

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MGAM O43451 1/20 0.39
GAA P10253 1/20 0.39
SI P14410 1/20 0.39
MGAM2 Q2M2H8 1/20 0.39
HTT P42858 1/20 0.36
ALDH1A1 P00352 2/20 0.35
TDP1 Q9NUW8 1/20 0.35
KDM4E B2RXH2 1/20 0.35
KDM6B O15054 1/20 0.35
KDM5C P41229 1/20 0.35
EGLN1 Q9GZT9 1/20 0.35
PHF8 Q9UPP1 1/20 0.35
KDM2A Q9Y2K7 1/20 0.35
TRPA1 O75762 1/20 0.33
KMT2A Q03164 1/20 0.33
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
HSD11B1 P28845 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL46501 0.97 MGAM (0.41) MGAMGAASIMGAM2HTT
SCHEMBL29640532 0.94 MGAM (0.39) MGAMGAASIMGAM2HTT
Acetone SCHEMBL28229144 0.92 MGAM (0.38) MGAMGAASIMGAM2HTT
SCHEMBL28018134 0.92 MGAM (0.38) MGAMGAASIMGAM2HTT
Ethylenediamine SCHEMBL9124549 0.87 PAOX (0.36) MGAMGAASIMGAM2HTT
SCHEMBL11026395 0.84 KMT2A (0.37) ALDH1A1KMT2ANPC1RAB9AHSD11B1
SCHEMBL10875669 0.83 KDM4E (0.42) MGAMGAASIMGAM2HTT
Acetoacetic Acid SCHEMBL4622741 0.81 KDM4E (0.41) MGAMGAASIMGAM2HTT
SCHEMBL4837194 0.81 KMT2A (0.39) ALDH1A1KMT2ANPC1RAB9AHSD11B1
SCHEMBL93393 0.81 KMT2A (0.39) ALDH1A1KMT2ANPC1RAB9AHSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109476963-A Pressure-sensitive adhesive item 德莎欧洲股份公司 2019-03-15 CN disclosed
CN-108699403-A adhesive strip 德莎欧洲股份公司 2018-10-23 CN disclosed
CN-108699285-A It is particularly used for the adhesive substance of curved surface 德莎欧洲股份公司 2018-10-23 CN disclosed
CN-106662814-A Photosensitive resin composition, resist laminate, cured product of photosensitive resin composition, and cured product of resist laminate (11) 日本化药株式会社 2017-05-10 CN disclosed
CN-105579436-A Onium salt, and composition containing same ASAHI KASEI E MATERIALS CORP 2016-05-11 CN disclosed