SCHEMBL28050989

SCHEMBL28050989

CCCCC[Si](OCC)(OCC)OCC.FC1CC=Cc2c1ccc1c2ccc2ccccc21

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
DRD2 P14416 1/20 0.32
SLC6A4 P31645 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28145645 0.99 DRD2 (0.31) DRD2SLC6A4
SCHEMBL27465800 0.99 DRD2 (0.31) DRD2SLC6A4
Tridecane SCHEMBL27695615 0.99 DRD2 (0.31) DRD2SLC6A4
SCHEMBL28767377 0.99 DRD2 (0.31) DRD2SLC6A4
SCHEMBL27515366 0.99 DRD2 (0.31) DRD2SLC6A4
SCHEMBL27903496 0.91 DRD2 (0.32) DRD2SLC6A4
SCHEMBL28767350 0.90 DRD2 (0.32) DRD2SLC6A4
SCHEMBL27465799 0.90 DRD2 (0.32) DRD2SLC6A4
SCHEMBL27781701 0.90 DRD2 (0.32) DRD2SLC6A4
Octane SCHEMBL28034052 0.87 KDM4E (0.37) DRD2SLC6A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103119691-B Photocurable nanoimprint composition, method for forming pattern using the composition, and nanoimprint replica mold having cured product of the composition TOKUYAMA CORP. (JP) 2016-01-13 CN disclosed
CN-103988313-A Method for manufacturing silicon substrate having textured structure TOKUYAMA CORPROATION 2014-08-13 CN disclosed
CN-103119691-A Photocurable nanoimprint composition, method for forming pattern using the composition, and nanoimprint replica mold having cured product of the composition TOKUYAMA CORP 2013-05-22 CN disclosed