SCHEMBL28053140

SCHEMBL28053140

CC(=O)OC(=O)C(N)C(C)C

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
SLC7A5 Q01650 1/20 0.46
TSHR P16473 3/20 0.43
ALDH1A1 P00352 3/20 0.43
HSD17B10 Q99714 2/20 0.42
TDP1 Q9NUW8 1/20 0.42
DPP4 P27487 2/20 0.34
FAP Q12884 1/20 0.34
DPP8 Q6V1X1 1/20 0.34
DPP9 Q86TI2 1/20 0.34
DPP7 Q9UHL4 1/20 0.34
LAP3 P28838 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.31
LMNA P02545 1/20 0.31
SLC1A3 P43003 1/20 0.30
SLC1A2 P43004 1/20 0.30
SLC1A1 P43005 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1615114 1.00 SLC7A5 (0.46) SLC7A5TSHRALDH1A1HSD17B10TDP1
SCHEMBL27671074 1.00 SLC7A5 (0.46) SLC7A5TSHRALDH1A1HSD17B10TDP1
SCHEMBL8058976 0.98 SLC7A5 (0.44) SLC7A5TSHRALDH1A1HSD17B10TDP1
SCHEMBL288204 0.87 SLC7A5 (0.52) SLC7A5TSHRDPP4FAPDPP8
SCHEMBL10530419 0.87 SLC7A5 (0.52) SLC7A5TSHRDPP4FAPDPP8
SCHEMBL27932393 0.87 SLC7A5 (0.52) SLC7A5TSHRDPP4FAPDPP8
SCHEMBL1582903 0.83 TSHR (0.41) SLC7A5TSHRALDH1A1HSD17B10TDP1
SCHEMBL7015572 0.82 SLC7A5 (0.48) SLC7A5TSHRDPP4FAPDPP8
SCHEMBL27968789 0.81 SLC7A5 (0.42) SLC7A5TSHRDPP4FAPDPP8
SCHEMBL28911829 0.80 SLC7A5 (0.46) SLC7A5TSHRDPP4FAPDPP8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105717747-B Photosensitive resin composition and application thereof 奇美实业股份有限公司 2021-12-21 CN claimed
CN-105717743-B Photosensitive resin composition and application thereof 奇美实业股份有限公司 2021-12-21 CN claimed
CN-105717747-B Photosensitive resin composition and application thereof 奇美实业股份有限公司 2021-12-21 CN disclosed
CN-105717743-B Photosensitive resin composition and application thereof 奇美实业股份有限公司 2021-12-21 CN disclosed
CN-105368913-A Bi-enzyme preparation method for industrial production of chiral unnatural amino acid BINHAI HANHONG BIOCHEMICAL CO LTD 2016-03-02 CN disclosed