SCHEMBL28054822

SCHEMBL28054822

CCCCCCCCCCc1ccccc1-c1cccc(S(=O)(=O)O)c1S(=O)(=O)O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LIPG Q9Y5X9 1/20 0.45
NR1H2 P55055 1/20 0.45
NR1H3 Q13133 1/20 0.45
BID P55957 3/20 0.43
MCL1 Q07820 3/20 0.43
BCL2L1 Q07817 2/20 0.43
BAK1 Q16611 2/20 0.43
KAT8 Q9H7Z6 2/20 0.43
PPARA Q07869 2/20 0.43
PPARG P37231 1/20 0.43
EP300 Q09472 1/20 0.43
KAT2A Q92830 1/20 0.43
KAT2B Q92831 1/20 0.43
KAT5 Q92993 1/20 0.43
SAE1 Q9UBE0 1/20 0.43
ELANE P08246 3/20 0.42
CTSG P08311 2/20 0.42
PTPN1 P18031 1/20 0.40
CYSLTR2 Q9NS75 4/20 0.40
CYSLTR1 Q9Y271 4/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1594278 1.00 LIPG (0.45) LIPGNR1H2NR1H3BIDMCL1
Ammonia Solution, Strong SCHEMBL27898384 0.99 LIPG (0.44) LIPGNR1H2NR1H3BIDMCL1
SCHEMBL6860460 0.90 LIPG (0.49) LIPGNR1H2NR1H3BIDMCL1
SCHEMBL2209708 0.90 LIPG (0.49) LIPGNR1H2NR1H3BIDMCL1
SCHEMBL28988406 0.89 LIPG (0.47) LIPGNR1H2NR1H3BIDMCL1
SCHEMBL27643276 0.89 PPARA (0.41) LIPGNR1H2NR1H3BIDMCL1
SCHEMBL7783841 0.87 BID (0.48) LIPGBIDMCL1BCL2L1BAK1
SCHEMBL7787191 0.87 BID (0.48) LIPGBIDMCL1BCL2L1BAK1
SCHEMBL7787170 0.87 BID (0.48) LIPGBIDMCL1BCL2L1BAK1
SCHEMBL339908 0.87 BID (0.48) LIPGBIDMCL1BCL2L1BAK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105368452-B Silicon oxide layer etching solution 易安爱富科技有限公司 2019-02-19 CN disclosed
CN-105368452-A Silicon oxide layer etching liquid ENF TECHNOLOGY CO LTD 2016-03-02 CN disclosed