SCHEMBL28056500

SCHEMBL28056500

NON.Nc1ccc(-c2ccccc2)cc1N

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.64
MEN1 O00255 2/20 0.64
KMT2A Q03164 2/20 0.64
HSD17B10 Q99714 3/20 0.57
MAPT P10636 3/20 0.57
ALDH1A1 P00352 3/20 0.57
KDM4E B2RXH2 1/20 0.57
USP2 O75604 1/20 0.57
LMNA P02545 1/20 0.57
HSP90AA1 P07900 1/20 0.57
GAA P10253 1/20 0.57
HPGD P15428 1/20 0.57
ALOX15 P16050 1/20 0.57
ALOX12 P18054 1/20 0.57
HTT P42858 1/20 0.57
IKBKB O14920 1/20 0.50
MAOA P21397 1/20 0.48
CYP3A4 P08684 2/20 0.48
TAAR1 Q96RJ0 1/20 0.48
KCNH2 Q12809 2/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL653071 0.93 TDP1 (0.74) TDP1MEN1KMT2AHSD17B10MAPT
SCHEMBL30392415 0.93 TDP1 (0.74) TDP1MEN1KMT2AHSD17B10MAPT
SCHEMBL27829121 0.93 TDP1 (0.74) TDP1MEN1KMT2AHSD17B10MAPT
Water SCHEMBL3120549 0.91 TDP1 (0.70) TDP1MEN1KMT2AHSD17B10MAPT
Methane SCHEMBL27562098 0.91 MEN1 (0.70) TDP1MEN1KMT2AHSD17B10MAPT
Formaldehyde SCHEMBL27638408 0.86 KMT2A (0.64) TDP1MEN1KMT2AHSD17B10MAPT
Sulfur Dioxide SCHEMBL29028945 0.84 KMT2A (0.61) TDP1MEN1KMT2AHSD17B10MAPT
SCHEMBL12772920 0.83 TDP1 (0.93) TDP1MEN1KMT2AHSD17B10MAPT
Ether SCHEMBL3120545 0.82 MEN1 (0.52) TDP1MEN1KMT2AHSD17B10MAPT
Hydrochloric Acid SCHEMBL1646515 0.80 TDP1 (0.88) TDP1MEN1KMT2AHSD17B10MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105601922-B Polyamic acid for two layers of flexible glue-free copper coated plate of method production and preparation method thereof 深圳市弘海电子材料技术有限公司 2018-05-22 CN claimed
CN-115863528-A Negative electrode slurry for secondary battery and preparation method thereof 桂林电器科学研究院有限公司 2023-03-28 CN disclosed
CN-115692709-A Negative electrode slurry for lithium ion battery and preparation method thereof 桂林电器科学研究院有限公司 2023-02-03 CN disclosed
CN-111073008-B Low-yellowing colorless transparent polyimide film and preparation method thereof 合肥中汇睿能能源科技有限公司 2022-04-19 CN disclosed
CN-111073008-A Low-yellowing colorless transparent polyimide film and preparation method thereof 合肥中汇睿能能源科技有限公司 2020-04-28 CN disclosed
CN-111040449-A Modified polyimide film and preparation method thereof 合肥中汇睿能能源科技有限公司 2020-04-21 CN disclosed
CN-110591359-A Colorless transparent polyimide film 合肥中汇睿能能源科技有限公司 2019-12-20 CN disclosed
CN-105665250-B Two layers of method prepares the flexible production line without glue polyimide copper clad lamination 深圳市弘海电子材料技术有限公司 2018-11-23 CN disclosed
CN-105537082-B Two layers of method prepares drying means of the flexibility without glue polyimide copper clad lamination when 深圳市弘海电子材料技术有限公司 2018-11-09 CN disclosed
CN-105598014-B Two layers of method prepares the flexible amination device without glue polyimide copper clad lamination 深圳市弘海电子材料技术有限公司 2018-11-09 CN disclosed
CN-105601922-B Polyamic acid for two layers of flexible glue-free copper coated plate of method production and preparation method thereof 深圳市弘海电子材料技术有限公司 2018-05-22 CN disclosed
CN-105694034-B Polyamic acid of flexible glue-free copper coated plate of high-dimensional stability and preparation method thereof 深圳市弘海电子材料技术有限公司 2018-05-22 CN disclosed
CN-105644064-B Two-layer method prepares the flexible method without glue polyimide copper clad lamination 深圳市弘海电子材料技术有限公司 2017-06-20 CN disclosed
CN-105694034-A High-dimensional-stability flexible adhesive-free copper clad plate polyamic acid and preparation method thereof 深圳市弘海电子材料技术有限公司 2016-06-22 CN disclosed
CN-105665250-A Production line for preparing flexible non-adhesive polyimide copper-clad plate through two-layer method 深圳市弘海电子材料技术有限公司 2016-06-15 CN disclosed
CN-105669976-A Amination method for preparing flexible adhesive-free polyimide CCL (copper-clad plate) with two-layer method 深圳市弘海电子材料技术有限公司 2016-06-15 CN disclosed
CN-105644064-A Method for preparing flexible non-adhesive polyimide copper-clad plate through two-layer method 深圳市弘海电子材料技术有限公司 2016-06-08 CN disclosed
CN-105598014-A Amination device for preparing flexible adhesive-free polyimide copper-clad plate by two-layer method SHENZHEN HONGHAI ELECTRONIC MAT TECH CO LTD 2016-05-25 CN disclosed
CN-105601922-A Polyamide acid for producing flexible copper plate coated with no rubber through two-layer method and preparing method of polyamide acid SHENZHEN HONGHAI ELECTRONIC MAT TECH CO LTD 2016-05-25 CN disclosed
CN-105537082-A Drying method used during preparation of flexible glue-free polyimide copper-clad plate through two-layer method SHENZHEN HONGHAI ELECTRONIC MAT TECH CO LTD 2016-05-04 CN disclosed