⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27498339 | 0.95 | LMNA (0.39) | — | |
| SCHEMBL31531053 | 0.95 | — | — | |
| SCHEMBL2549770 | 0.95 | — | — | |
| SCHEMBL21801783 | 0.95 | — | — | |
| SCHEMBL239639 | 0.95 | — | — | |
| Water SCHEMBL4447354 | 0.91 | — | — | |
| Hydrochloric Acid SCHEMBL27625637 | 0.91 | — | — | |
| Hydrogen Sulfide SCHEMBL28090865 | 0.91 | — | — | |
| Fluoride SCHEMBL27799186 | 0.91 | — | — | |
| Ammonia Solution, Strong SCHEMBL27458702 | 0.91 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105732974-B | Sulfamic acid based polymer for copper electroplating | 罗门哈斯电子材料有限责任公司 | 2018-10-12 | — | — | CN | disclosed |
| CN-105732974-A | AMINO SULFONIC ACID BASED POLYMERS FOR COPPER ELECTROPLATING | 罗门哈斯电子材料有限责任公司 | 2016-07-06 | — | — | CN | disclosed |