SCHEMBL2805843

SCHEMBL2805843

O=C(O)CCCC1CC(=O)OC1=O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.39
ALDH1A1 P00352 2/20 0.39
ALOX5 P09917 1/20 0.35
LMNA P02545 5/20 0.34
SLC22A6 Q4U2R8 1/20 0.34
KMT2A Q03164 3/20 0.34
THRB P10828 2/20 0.34
BLM P54132 2/20 0.34
GABRR3 A8MPY1 1/20 0.34
GABRP O00591 1/20 0.34
GABRD O14764 1/20 0.34
HDAC3 O15379 1/20 0.34
GABBR2 O75899 1/20 0.34
CYP1A2 P05177 1/20 0.34
GABRA1 P14867 1/20 0.34
GABRB1 P18505 1/20 0.34
GABRG2 P18507 1/20 0.34
GABRR1 P24046 1/20 0.34
GABRB3 P28472 1/20 0.34
GABRR2 P28476 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2477172 0.89 FOLH1 (0.42) TSHRALDH1A1NPSR1FOLH1
SCHEMBL31634583 0.84 ALDH1A1 (0.41) TSHRALDH1A1CYP2C9ACHE
SCHEMBL12000454 0.82 ALDH1A1 (0.46) TSHRALDH1A1
SCHEMBL15095421 0.82 ALDH1A1 (0.46) TSHRALDH1A1CYP1A2
SCHEMBL16522363 0.81 ALDH1A1 (0.49) TSHRALDH1A1CYP1A2
SCHEMBL20251162 0.81 ALDH1A1 (0.49) TSHRALDH1A1CYP1A2
SCHEMBL20251160 0.81 ALDH1A1 (0.49) TSHRALDH1A1CYP1A2
SCHEMBL20251191 0.81 ALDH1A1 (0.49) TSHRALDH1A1CYP1A2
SCHEMBL18724837 0.79 ALDH1A1 (0.41) TSHRALDH1A1
SCHEMBL13642789 0.78 ALDH1A1 (0.42) TSHRALDH1A1CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8323533-B2 Composition for manufacturing indurative resin, indurative resin manufactured by the composition and ink composition comprising the resin LG CHEM, LTD. (KR) 2012-12-04 US disclosed
US-8323533-B2 Composition for manufacturing indurative resin, indurative resin manufactured by the composition and ink composition comprising the resin LG CHEM, LTD. (KR) 2012-12-04 US disclosed
US-8304169-B2 Alkali-developable resins, method for preparing the same and photosensitive composition comprising the alkali-developable resins LG CHEM, LTD. (KR) 2012-11-06 US disclosed
US-8304169-B2 Alkali-developable resins, method for preparing the same and photosensitive composition comprising the alkali-developable resins LG CHEM, LTD. (KR) 2012-11-06 US disclosed
US-8293847-B2 Film-like adhesive, adhesive sheet, and semiconductor device using same HITACHI CHEMICAL CO., LTD. (JP) 2012-10-23 US disclosed
US-20100323295-A1 ALKALI-DEVELOPABLE RESINS, METHOD FOR PREPARING THE SAME AND PHOTOSENSITIVE COMPOSITION COMPRISING THE ALKALI-DEVELOPABLE RESINS LG CHEM, LTD. (KR) 2010-12-23 US disclosed
US-20100323295-A1 ALKALI-DEVELOPABLE RESINS, METHOD FOR PREPARING THE SAME AND PHOTOSENSITIVE COMPOSITION COMPRISING THE ALKALI-DEVELOPABLE RESINS LG CHEM, LTD. (KR) 2010-12-23 US disclosed
US-20100239858-A1 FILM-LIKE ADHESIVE, ADHESIVE SHEET, AND SEMICONDUCTOR DEVICE USING SAME HITACHI CHEMICAL CO., LTD., (JP) 2010-09-23 US disclosed
US-20100051883-A1 COMPOSITION FOR MANUFACTURING INDURATIVE RESIN, INDURATIVE RESIN MANUFACTURED BY THE COMPOSITION AND INK COMPOSITION COMPRISING THE RESIN LG CHEM LTD (KR) 2010-03-04 US disclosed
US-20100051883-A1 COMPOSITION FOR MANUFACTURING INDURATIVE RESIN, INDURATIVE RESIN MANUFACTURED BY THE COMPOSITION AND INK COMPOSITION COMPRISING THE RESIN LG CHEM LTD (KR) 2010-03-04 US disclosed
EP-2053108-A1 FILM ADHESIVE, ADHESIVE SHEET, AND SEMICONDUCTOR DEVICE USING THE SAME Hitachi Chemical Co., Ltd. (JP) 2009-04-29 EP disclosed
WO-2008097065-A9 ALKALI-DEVELOPABLE RESINS, METHOD FOR PREPARING THE SAME AND PHOTOSENSITIVE COMPOSITION COMPRISING THE ALKALI-DEVELOPABLE RESINS LG CHEMICAL LTD (KR) 2008-12-18 WO disclosed
EP-0269187-B1 AMPHIPHATIC POLYMERIZABLE VINYL MONOMERS, VINYL RESIN PARTICLES DERIVED FROM SAID MONOMERS AND PREPARATION THEREOF Nippon Paint Co., Ltd. (JP) 1992-01-29 EP disclosed
US-4908468-A Amphiphatic polymerizable vinyl monomers, vinyl resin particles derived from said monomers and preparation thereof NIPPON PAINT CO., LTD. (JP) 1990-03-13 US disclosed