SCHEMBL28058979

SCHEMBL28058979

CC(C)(C)C(=O)OC=O.[LiH]

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.35
ELANE P08246 4/20 0.33
PRKCA P17252 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2643 0.97
SCHEMBL28058895 0.94 TDP1 (0.35) TDP1ELANEPRKCA
SCHEMBL27634463 0.94 TDP1 (0.35) TDP1ELANEPRKCA
SCHEMBL28058977 0.94 TDP1 (0.35) TDP1ELANEPRKCA
SCHEMBL2308529 0.78
SCHEMBL1180013 0.77 ELANE (0.36) ELANEPRKCA
SCHEMBL9149533 0.76
SCHEMBL27474514 0.76
SCHEMBL9688370 0.74
SCHEMBL120221 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105470565-A Composition for forming lithium reduction resistant layer, film forming method, and lithium secondary battery SEIKO EPSON CORP 2016-04-06 CN disclosed