SCHEMBL2806450

SCHEMBL2806450

CC(=CCC12CC3CC(O)(CC(O)(C3)C1)C2)C(=O)O

nearest known ligand 0.36

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CD81 P60033 1/20 0.33
DPP4 P27487 1/20 0.32
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5935975 0.91 CD81 (0.30) CD81
SCHEMBL5935977 0.90 MEN1 (0.36) CD81
SCHEMBL5935925 0.89 ALDH1A1 (0.40) ALDH1A1
SCHEMBL2409515 0.86 ALDH1A1 (0.38) CD81ALDH1A1
SCHEMBL5935952 0.86 DPP4 (0.31) DPP4
SCHEMBL5935927 0.85 ALDH1A1 (0.34) ALDH1A1
SCHEMBL5935907 0.83 CD81 (0.33) CD81ALDH1A1
SCHEMBL5935958 0.80 ALDH1A1 (0.44) CD81ALDH1A1
SCHEMBL2409328 0.78 ALDH1A1 (0.42) CD81ALDH1A1
SCHEMBL5935946 0.77 MEN1 (0.37) CD81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9348226-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2016-05-24 US disclosed
US-8808974-B2 Method for forming pattern JSR CORPORATION (JP) 2014-08-19 US disclosed
US-8431324-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2013-04-30 US disclosed
US-8182977-B2 Polymer and positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2012-05-22 US disclosed
US-20100285405-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-11-11 US disclosed
US-20100239981-A1 POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-09-23 US disclosed
US-20060234154-A1 Mixture containing acid generator and free radical catalyst; acrylated ester monomer JSR CORPORATION (JP) 2006-10-19 US disclosed