SCHEMBL28066032

SCHEMBL28066032

CCCC1CCCC(C=O)C1

nearest known ligand 0.39

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
ADH1A P07327 4/20 0.36
ADH1C P00326 3/20 0.36
ADH1B P00325 1/20 0.36
ADH4 P08319 1/20 0.36
ADH7 P40394 1/20 0.36
CYP1A2 P05177 1/20 0.34
CHRNA7 P36544 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12805814 0.96 ADH1A (0.34) ADH1AADH1CADH1BADH4ADH7
SCHEMBL12805322 0.93 CYP1A2 (0.38) ADH1AADH1CADH1BADH4ADH7
SCHEMBL12805533 0.93 CYP1A2 (0.38) ADH1AADH1CADH1BADH4ADH7
SCHEMBL12805819 0.91 CYP1A2 (0.37) ADH1AADH1CADH1BADH4ADH7
SCHEMBL12805920 0.91 CYP1A2 (0.37) ADH1AADH1CADH1BADH4ADH7
SCHEMBL12805929 0.91 CYP1A2 (0.37) ADH1AADH1CADH1BADH4ADH7
SCHEMBL12805536 0.91 CYP1A2 (0.37) ADH1AADH1CADH1BADH4ADH7
SCHEMBL12805577 0.91 CYP1A2 (0.37) ADH1AADH1CADH1BADH4ADH7
SCHEMBL12805104 0.91 CYP1A2 (0.37) ADH1AADH1CADH1BADH4ADH7
SCHEMBL28389484 0.89 CYP1A2 (0.50) ADH1AADH1CADH1BADH4ADH7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112334795-A Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device 东京应化工业株式会社 2021-02-05 CN disclosed
CN-107429059-B Energy-sensitive resin composition 东京应化工业株式会社 2020-10-23 CN disclosed
CN-106575080-B Energy-sensitive resin composition 东京应化工业株式会社 2020-08-11 CN disclosed
CN-105579907-B Radiation-sensitive composition and pattern production method 东京应化工业株式会社 2019-12-17 CN disclosed
CN-107429059-A ENERGY-SENSITIVE RESIN COMPOSITION 东京应化工业株式会社 2017-12-01 CN disclosed
CN-106575080-A Energy-sensitive resin composition 东京应化工业株式会社 2017-04-19 CN disclosed
CN-105579907-A Radiation-sensitive composition and pattern production method TOKYO OHKA KOGYO CO LTD 2016-05-11 CN disclosed