⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1567513 | 0.88 | TRPA1 (0.32) | — | |
| SCHEMBL17072340 | 0.76 | — | — | |
| SCHEMBL157305 | 0.74 | — | — | |
| SCHEMBL4595551 | 0.71 | GRIK1 (0.39) | — | |
| SCHEMBL9185971 | 0.71 | GRIK1 (0.39) | — | |
| SCHEMBL2953961 | 0.71 | — | — | |
| SCHEMBL3697117 | 0.71 | ATM (0.38) | — | |
| SCHEMBL3697115 | 0.71 | ATM (0.38) | — | |
| SCHEMBL8907019 | 0.70 | — | — | |
| SCHEMBL27746107 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110352134-A | The manufacturing method and printing machine of printed article | 东丽株式会社 | 2019-10-18 | — | — | CN | disclosed |
| CN-110325886-A | Cured film is formed with composition, orientation material and phase difference material | 日产化学株式会社 | 2019-10-11 | — | — | CN | disclosed |
| CN-110167980-A | Composition for forming cured film, alignment material, and phase difference material | 日产化学株式会社 | 2019-08-23 | — | — | CN | disclosed |
| CN-104641294-B | Negative light-sensitive resin combination | 日产化学工业株式会社 | 2019-08-23 | — | — | CN | disclosed |
| CN-104040432-B | Negative photosensitive resin composition | 日产化学工业株式会社 | 2018-09-14 | — | — | CN | disclosed |
| CN-108350296-A | Lithographic printing ink | 东丽株式会社 | 2018-07-31 | — | — | CN | disclosed |
| CN-108292630-A | Ferroelectric memory element, its manufacturing method and using its storage unit and use its wireless communication device | 东丽株式会社 | 2018-07-17 | — | — | CN | disclosed |
| CN-108026399-A | Lithographic printing ink, lithographic plate ink varnish and the manufacture method using its printed article | 东丽株式会社 | 2018-05-11 | — | — | CN | disclosed |
| CN-107207641-A | Composition for forming cured film, alignment material, and phase difference material | 日产化学工业株式会社 | 2017-09-26 | — | — | CN | disclosed |
| CN-104838295-B | Anti-glare film and polarizing plate having the same | 东友精细化工有限公司 | 2017-05-03 | — | — | CN | disclosed |
| CN-103443708-B | Negative photosensitive resin composition | 日产化学工业株式会社 | 2016-08-24 | — | — | CN | disclosed |
| CN-105765458-A | Negative photosensitive resin composition | 日产化学工业株式会社 | 2016-07-13 | — | — | CN | disclosed |
| CN-102934028-B | Photosensitive polymer combination and display equipment | 日产化学工业株式会社 | 2016-06-29 | — | — | CN | disclosed |