SCHEMBL28070843

SCHEMBL28070843

C=C(C(=O)OC)C(=O)C(O)=CC

nearest known ligand 0.42

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.42
EGLN1 Q9GZT9 1/20 0.31
HCAR2 Q8TDS4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28224140 0.78 ALDH1A1 (0.52) ALDH1A1EGLN1HCAR2
SCHEMBL3041576 0.75
SCHEMBL3041579 0.75
SCHEMBL6850521 0.74 ALDH1A1 (0.61) ALDH1A1EGLN1HCAR2
SCHEMBL40660 0.74 ALDH1A1 (0.61) ALDH1A1EGLN1HCAR2
SCHEMBL27440036 0.73 ALDH1A1 (0.62) ALDH1A1EGLN1
SCHEMBL6657629 0.72
Ammonia Solution, Strong SCHEMBL8970989 0.72 ALDH1A1 (0.58) ALDH1A1EGLN1HCAR2
SCHEMBL27628843 0.70
SCHEMBL11452476 0.70 ALDH1A1 (0.50) ALDH1A1EGLN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110317174-A Hydrogen barrier, hydrogen barrier film, which are formed, uses composition, hydrogen barrier film, the manufacturing method of hydrogen barrier film and electronic component 东京应化工业株式会社 2019-10-11 CN disclosed
CN-110066225-A Double oxime ester lightlike initiating agents, preparation method, photosensitive polymer combination and application 常州强力先端电子材料有限公司 2019-07-30 CN disclosed
CN-110066352-A Oxime ester lightlike initiating agent, preparation method, photosensitive polymer combination and application 常州强力先端电子材料有限公司 2019-07-30 CN disclosed
CN-109962089-A The manufacturing method of wavelength convert substrate 东京应化工业株式会社 2019-07-02 CN disclosed
CN-107903156-B Photosensitive composite and compound 东京应化工业株式会社 2019-05-31 CN disclosed
CN-109459914-A Light curing resin composition and its application 常州强力先端电子材料有限公司 2019-03-12 CN disclosed
CN-109426079-A Photosensitive composite, solidfied material forming method, solidfied material, device used for image display panel and image display device 东京应化工业株式会社 2019-03-05 CN disclosed
CN-109283792-A Photosensitive composite, pattern forming method, solidfied material and display device 东京应化工业株式会社 2019-01-29 CN disclosed
CN-109143778-A Resin combination, cured film, the manufacturing method of colour filter and cured film 东京应化工业株式会社 2019-01-04 CN disclosed
CN-109134712-A Fluorenes class polyfunctionality photoinitiator, preparation method and its application 常州强力先端电子材料有限公司 2019-01-04 CN disclosed
CN-106537254-A Photosensitive composition and compound 东京应化工业株式会社 2017-03-22 CN disclosed
CN-106371287-A Coloured photosensitive composition 东京应化工业株式会社 2017-02-01 CN disclosed
CN-105676601-A Pretreatment method of glass substrate used for forming etching mask 东京应化工业株式会社 2016-06-15 CN disclosed