Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL27829916 | 0.90 | ALDH1A1 (0.38) | ALDH1A1 | |
| SCHEMBL933216 | 0.89 | ALDH1A1 (0.41) | ALDH1A1 | |
| SCHEMBL9245577 | 0.89 | ALDH1A1 (0.41) | ALDH1A1 | |
| Acrylic Acid SCHEMBL28266922 | 0.87 | ALDH1A1 (0.36) | ALDH1A1 | |
| SCHEMBL28241135 | 0.79 | KRAS (0.36) | ALDH1A1 | |
| SCHEMBL28872314 | 0.79 | ALDH1A1 (0.51) | ALDH1A1 | |
| SCHEMBL17530555 | 0.78 | ALDH1A1 (0.41) | ALDH1A1 | |
| SCHEMBL22834335 | 0.78 | ALDH1A1 (0.41) | ALDH1A1 | |
| SCHEMBL27708634 | 0.77 | ALDH1A1 (0.42) | ALDH1A1 | |
| SCHEMBL4542323 | 0.77 | ALDH1A1 (0.51) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105824193-A | Photosensitive resin composition, cured film formed from the same and image display comprising the cured film | 东友精细化工有限公司 | 2016-08-03 | — | — | CN | disclosed |
| CN-105824194-A | Photosensitive resin composition, photo-curable pattern formed from the same and image display comprising the pattern | 东友精细化工有限公司 | 2016-08-03 | — | — | CN | disclosed |
| CN-105785720-A | Photosensitive resin composition, photocurable pattern formed from the same and image display comprising the pattern | 东友精细化工有限公司 | 2016-07-20 | — | — | CN | disclosed |
| CN-105785717-A | Photosensitive resin composition, photocurable pattern formed from the same and image display comprising the pattern | 东友精细化工有限公司 | 2016-07-20 | — | — | CN | disclosed |