1,4-Diethoxybenzene

1,4-Diethoxybenzene

SCHEMBL28074334

CCC=O.CCOc1ccc(OCC)cc1

nearest known ligand 0.70

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NQO1 P15559 1/20 0.70
TDP1 Q9NUW8 2/20 0.56
TSHR P16473 1/20 0.56
LTA4H P09960 2/20 0.52
PARP10 Q53GL7 1/20 0.52
RELA Q04206 1/20 0.52
CA12 O43570 1/20 0.52
CA1 P00915 1/20 0.52
CA2 P00918 1/20 0.52
CA7 P43166 1/20 0.52
CA9 Q16790 1/20 0.52
ALDH1A1 P00352 3/20 0.49
NPC1 O15118 2/20 0.48
PLK1 P53350 1/20 0.48
POLB P06746 1/20 0.48
MEN1 O00255 1/20 0.48
LMNA P02545 1/20 0.48
CYP1A2 P05177 1/20 0.48
KMT2A Q03164 1/20 0.48
KDM4E B2RXH2 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phenetole SCHEMBL27329111 0.89 LTA4H (0.63) NQO1TDP1TSHRLTA4HRELA
SCHEMBL20442679 0.86 NQO1 (0.64) NQO1TDP1TSHRLTA4HPARP10
SCHEMBL2559226 0.84 NQO1 (0.61) NQO1TDP1TSHRLTA4HPARP10
1,4-Diethoxybenzene SCHEMBL28186701 0.84 NQO1 (1.00) NQO1TDP1TSHRLTA4HPARP10
1,4-Diethoxybenzene SCHEMBL124015 0.84 NQO1 (1.00) NQO1TDP1TSHRLTA4HPARP10
SCHEMBL7352176 0.82 NQO1 (0.58) NQO1TDP1TSHRLTA4HPARP10
SCHEMBL19043241 0.82 NQO1 (0.58) NQO1TDP1TSHRLTA4HPARP10
SCHEMBL342467 0.81 NQO1 (0.64) NQO1TDP1TSHRRELAALDH1A1
SCHEMBL2096167 0.81 NQO1 (0.64) NQO1TDP1TSHRLTA4HPARP10
1,4-Diethoxybenzene SCHEMBL11794798 0.81 NQO1 (0.93) NQO1TDP1TSHRLTA4HPARP10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108196426-A For the photoresist of GPP techniques, preparation method and its photoetching process 潍坊星泰克微电子材料有限公司 2018-06-22 CN claimed
CN-110461589-A Polymeric substrate with hard conating TEIJIN LTD 2019-11-15 CN disclosed
CN-110402275-A Ultraviolet-curable ink composition, method of manufacturing bezel pattern in display substrate using the same, and bezel pattern manufactured thereby LG CHEMICAL LTD 2019-11-01 CN disclosed
CN-110291121-A Gap filler, the tool for processing gap filler and external member and illuminating device KDS控股有限公司 2019-09-27 CN disclosed
CN-107004384-B Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate using same, and frame pattern manufactured thereby 株式会社LG化学 2019-09-06 CN disclosed
CN-106164132-B polyimide composition 富士胶片电子材料美国有限公司 2019-08-23 CN disclosed
CN-106488959-B Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate by using same, and frame pattern manufactured by using same 株式会社LG化学 2019-08-23 CN disclosed
CN-110088163-A Curable resin composition, and film, molded article, prepreg, and fiber-reinforced plastic using same 三菱化学株式会社 2019-08-02 CN disclosed
CN-105849862-B Resin combination, dry-etching photoresistive mask and pattern forming method DIC株式会社 2019-07-05 CN disclosed
CN-109750523-A Synthetic leather and its manufacturing method DIC株式会社 2019-05-14 CN disclosed
CN-107004384-A Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate using same, and frame pattern manufactured thereby 株式会社LG化学 2017-08-01 CN disclosed
CN-107001826-A Ultraviolet-curable ink composition, method of manufacturing bezel pattern of display substrate using the same, and bezel pattern manufactured thereby 株式会社LG化学 2017-08-01 CN disclosed
CN-107001825-A Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate using same, and frame pattern manufactured thereby 株式会社LG化学 2017-08-01 CN disclosed
CN-107001824-A Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate using same, and frame pattern manufactured thereby 株式会社LG化学 2017-08-01 CN disclosed
CN-105658699-B Fluorine-containing compound, composition for forming hard coat layer, and article having hard coat layer 旭硝子株式会社 2017-06-23 CN disclosed
CN-106536644-A Ultraviolet-curable ink composition, method of manufacturing bezel pattern of display substrate using the same, and bezel pattern manufactured thereby 株式会社LG化学 2017-03-22 CN disclosed
CN-106488959-A Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate by using same, and frame pattern manufactured by using same 株式会社LG化学 2017-03-08 CN disclosed
CN-106164132-A Novel polyimide compositions 富士胶片电子材料美国有限公司 2016-11-23 CN disclosed
CN-106032444-A Anti-reflection glue film and manufacturing method thereof 逢甲大学 2016-10-19 CN disclosed
CN-104080877-B Anti-fingerprint adhesive agent and manufacture method, hard coat compositions, the base material with hard coat and touch screen 旭硝子株式会社 2016-08-17 CN disclosed